Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Multilayer shielding film and manufacturing method thereof

A multi-layer shielding and manufacturing method technology, applied in the fields of magnetic/electric field shielding, chemical instruments and methods, lamination, etc., can solve the problems of weak shielding ability, inability to completely prevent electromagnetic pollution, secondary pollution of space environment, etc., and achieve Good shielding and absorbing properties, prevention and control of electromagnetic radiation pollution, and wide application range

Inactive Publication Date: 2020-05-12
SUZHOU UNIV
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, the shielding reflective transparent shielding film will reflect electromagnetic radiation back to the space, causing secondary pollution to the space environment, and cannot completely prevent and control electromagnetic pollution
The transparent metal oxide film mainly made of indium tin oxide is widely used in the occasions where visible light is transparent, but its light transmission band is narrow. Although the microwave shielding band is wide, the shielding ability is not strong, and the material is hard and flexible. , unable to carry out surface bonding well

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Multilayer shielding film and manufacturing method thereof
  • Multilayer shielding film and manufacturing method thereof
  • Multilayer shielding film and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] like figure 1 The first preferred embodiment of a multilayer shielding film of the present invention is shown, the shielding film includes two superimposed unit films, an adhesive layer is arranged between the two unit films, and the two unit films The films are connected by the adhesive layer. The unit film includes a substrate layer 10 , a shielding layer 20 and a wave-absorbing layer 30 . The substrate layer 10 has a first surface 11 and a second surface 12 opposite to each other. The first surface 11 has several grooves 111 uniformly distributed on the first surface 11 . The grooves 111 form interconnected grids on the first surface 11, and the grids may be periodic or aperiodic. figure 1 The cross-section of the groove 111 is rectangular, but it should be noted that the cross-section of the groove 111 can also be set as a square or trapezoid. The two unit films are respectively connected to the adhesive layer through the first surface 11 and the second surface ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Heightaaaaaaaaaa
Separation distanceaaaaaaaaaa
Login to View More

Abstract

The invention discloses a multilayer shielding film and a manufacturing method thereof. The multilayer shielding film comprises a plurality of unit films, wherein the unit film comprises a base material layer, a shielding layer and a wave absorbing layer, one surface of the base material layer is provided with a plurality of grooves, the groove is filled with a shielding material to form the shielding layer, the wave absorbing layer at least covers the shielding layer or at least covers the shielding layer and the surface, provided with the grooves, of the base material layer, and the unit films are arranged in an overlapped mode or in a back-to-back mode to form a multilayer structure. According to the invention, the multilayer shielding film has the advantages of strong shielding capability, good flexibility, convenient attachment and wide application range while maintaining the transparent characteristic, can effectively reduce reflection back of electromagnetic radiation to space,is beneficial to reducing electromagnetic radiation pollution, has good shielding performance, and is not easy to be detected by reflected waves; and the multilayer structure is strong in shielding capability, and is suitable for occasions with high requirements on shielding capability.

Description

technical field [0001] The invention relates to the technical field of electromagnetic shielding, and more precisely relates to a multilayer shielding film and a manufacturing method thereof. Background technique [0002] With the development of technology, radio frequency devices are widely used. Common radio frequency equipment, such as industrial electrical equipment, radio and television transmission towers, wireless communication networks, high-voltage transmission lines, household appliances, etc., will transmit electromagnetic wave energy to the outside during work, generating electromagnetic radiation, which will affect the human body or machines. Its degree is directly related to its energy. The energy generated by electromagnetic radiation depends on its frequency. It can be arranged into several levels from low to high according to its frequency. The higher the frequency, the higher the energy generated by electromagnetic radiation. The bigger it is, the excessiv...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H05K9/00B32B3/08B32B3/12B32B3/30B32B7/12B32B9/00B32B9/04B32B15/04B32B27/06B32B27/36B32B33/00B32B37/12
CPCB32B3/08B32B3/12B32B3/30B32B7/12B32B9/00B32B9/007B32B9/04B32B15/04B32B27/06B32B27/36B32B27/365B32B33/00B32B37/12B32B2307/212H05K9/0088
Inventor 刘艳花徐建龙
Owner SUZHOU UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products