Structure for lowering wet discharging tailings warehouse seepage line and design method

A design method and technology of infiltration line, applied in infrastructure engineering, water conservancy engineering equipment, sea area engineering, etc., can solve the problems of shallow burial depth of infiltration line of tailings pond, prone to dam failure, etc., so as to reduce the infiltration line and increase the bottom slope, ensuring the effect of reducing

Active Publication Date: 2020-06-19
SHIJIAZHUANG TIEDAO UNIV
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide a structure and design method for reducing the infiltration line of the wet discharge

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Structure for lowering wet discharging tailings warehouse seepage line and design method
  • Structure for lowering wet discharging tailings warehouse seepage line and design method
  • Structure for lowering wet discharging tailings warehouse seepage line and design method

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach

[0040] As a specific implementation of the design method for reducing the structure of the wet discharge tailings dam infiltration line 7 provided by the present invention, please refer to figure 1 , including the following steps:

[0041] (1) Determine the design position of the infiltration line 7 according to the characteristics of the tailings pond;

[0042] (2) Referring to the design position of the wetting line 7, calculate and determine the angle θ between the equivalent bottom slope line 8 formed at the front end of the anti-seepage layer 3 and the horizontal direction;

[0043] (3) Determine the number of laying anti-seepage layers 3 and the position interval of each anti-seepage layer 3 .

[0044] In this embodiment, first, according to the characteristics of tailings ponds, combined with the requirements of the "Tailings Pond Safety Technical Regulations" and "Tailings Facilities Design Specifications", the design position of the infiltration line 7 is determined;...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a structure for lowering a wet discharging tailings warehouse seepage line and a design method, and belongs to the technical field of tailings warehouse design and structures. The structure for lowering the wet discharging tailings warehouse seepage line comprises a dam body and anti-seepage layers, and the dam body is arranged on the ground. The multiple anti-seepage layersare arranged, arranged in the dam body, closely attached to the dam body, arranged at intervals and horizontally laid or laid parallel to the dry beach face. One ends of the multiple anti-seepage layers are connected with the ground, the other ends of the multiple anti-seepage layers are located on the same inclined line, and the inclined line passes through the intersection point of the inner slope surface of the side, close to the anti-seepage layers, of a preliminary-stage dam and the bottom face of the preliminary-stage dam. According to the provided structure for lowering the wet discharging tailings warehouse seepage line, the anti-seepage layers are arranged, an equivalent bottom slope line is formed, the tailings warehouse bottom slope is enlarged, and accordingly the seepage lineis lowered. According to the design method of the structure for lowering the wet discharging tailings warehouse seepage line, parameter determination of the structure for lowering the wet dischargingtailings warehouse seepage line is facilitated, and construction accuracy is guaranteed.

Description

technical field [0001] The invention belongs to the technical field of tailings pond design and structure, and more specifically relates to a structure and a design method for reducing the infiltration line of wet discharge tailings pond. Background technique [0002] Tailings pool refers to the place where dams are built to intercept valley mouths or enclosures, and are used to stockpile metal or non-metal mines for ore sorting and then discharge tailings or other industrial waste. Most of the existing tailings facilities at home and abroad are traditional wet-discharge tailings ponds. In my country, wet-discharge tailings ponds account for more than 95%. The free liquid surface in the seepage field of the tailings pond is called the "wetting line". The stability of the tailings dam is the main measure of the safety of the tailings pond, and the infiltration line of the tailings pond is buried shallowly, which is prone to dam failure. Contents of the invention [0003] ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): E02B1/00E02B3/16E02D31/00G06F30/13
CPCE02B1/00E02B3/16E02D31/004
Inventor 李强甄丰豪牛红凯武璧泽高松葛俊颖
Owner SHIJIAZHUANG TIEDAO UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap