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Optical three-dimensional measurement system

A technology of three-dimensional measurement and light source system, applied in the field of three-dimensional measurement, can solve the problems of large stray light interference, poor uniformity, and limited three-dimensional measurement applications, and achieve the effect of high measurement accuracy and fast measurement speed.

Pending Publication Date: 2020-06-19
ELEMENTARY OPTOMATION CO LTD
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Problems solved by technology

It is a surface area measurement system and is suitable for measuring three-dimensional surfaces, but its measurement field of view is relatively small, the illumination light intensity is low, the uniformity is poor, and stray light interference is large
These problems greatly limit its 3D measurement application in semiconductor production

Method used

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  • Optical three-dimensional measurement system
  • Optical three-dimensional measurement system
  • Optical three-dimensional measurement system

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Experimental program
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Embodiment Construction

[0030] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0031] like figure 1 and figure 2 The optical three-dimensional measurement system shown includes a light source system 1, a first beam splitter 4 is arranged obliquely on one side of the light source system 1, and a Nipkow disk 5 is arranged on one side of the first beam splitter 4, so There are many small pinholes on the Nipkov disc 5, and it is in the process of high-speed operation ，The parallel light emitted by the light source system 1 is deflected at 90 degrees by the first beam splitter 4 and directed to the Nipkow disk 5, and the side of the Nipkow disk 5 away from the first beam splitter 4 is sequentially provided with The first projection objective lens 6, the chromatic aberration lens 7 and the microscopic objective lens 9, the side of the microscopic objective lens 9 far away from the chromatic aberration lens 7 is also provide...

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Abstract

The invention discloses an optical three-dimensional measurement system which is specially used for high-speed online automatic detection of a semiconductor wafer and a wafer packaging connection line, and the three-dimensional measurement system of the system can obtain the three-dimensional morphology of the surface of a whole object only by collecting one image, so that the measurement speed isextremely high, and the system is particularly suitable for online high-speed three-dimensional detection. The measuring system is also suitable for detecting three-dimensional surface appearances ofprecision parts of other various objects, especially discontinuous surfaces which cannot be detected by other three-dimensional measuring systems.

Description

technical field [0001] The invention relates to the field of three-dimensional measurement, in particular to an optical three-dimensional measurement system. Background technique [0002] Optical confocal 3D profilers are being more and more widely used in industrial 3D profile measurement. However, since the optical confocal measurement technique is a point measurement technique, only one point can be measured at a time. If a surface is to be measured, it requires vertical and lateral scans to measure the 3D profile of an area. At present, most industrial optical confocal three-dimensional profilers at home and abroad are completed by optical confocal sensors and mechanical scanning mechanisms. Manufacturers of optical confocal sensors include STIL SA, Fogale Nanotech, Micro Epsilon, FRT, Precitec, etc. The optical confocal sensor can measure the surface height of a point at high speed, but to get the surface profile of an area, it needs to scan point by point, so the me...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/25
CPCG01B11/25G02B21/0044G01B11/24G01B2210/50G02B21/0016G02B21/0064G02B21/006
Inventor 方仲平吴友仁
Owner ELEMENTARY OPTOMATION CO LTD
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