Low-temperature polycrystalline silicon display panel, manufacturing method thereof and liquid crystal display device

Abstract

The embodiment of the invention provides a low-temperature polycrystalline silicon display panel, a manufacturing method of the low-temperature polycrystalline silicon display panel and a liquid crystal display device, relates to the technical field of display, and effectively improves a metal light leakage phenomenon on the premise of ensuring relatively high display performance. The low-temperature polycrystalline silicon display panel comprises an array substrate and a box aligning substrate which are oppositely arranged, and liquid crystals filled between the array substrate and the box aligning substrate. The array substrate comprises a substrate body, and a low-temperature polycrystalline silicon active layer, a grid electrode layer and a source and drain electrode layer are sequentially arranged on the substrate body in the light emitting direction. The low-temperature polycrystalline silicon display panel further comprises a color film layer, the color film layer being arrangedon the array substrate, and the color film layer being located on the side, back on to the substrate, of the source-drain electrode layer; a shading layer, used for limiting an opening area of the low-temperature polycrystalline silicon display panel, at least part of the shading layer being arranged on the array substrate, and the shading layer on the array substrate being located on the side, back on to the substrate, of the source-drain electrode layer.

Description

【Technical field】 [0001] The invention relates to the field of display technology, in particular to a low-temperature polysilicon display panel, a manufacturing method thereof, and a liquid crystal display device. 【Background technique】 [0002] Low Temperature Poly-silicon (LTPS for short) display panels have the advantages of high resolution, fast response, high brightness, etc., and have been more and more widely used. For the LTPS liquid crystal display panel, it includes an array substrate and a color filter substrate that are oppositely arranged, wherein the array substrate is provided with a thin film transistor layer, and the color filter substrate is provided with a color filter layer and a black matrix. However, if the panel with this structure is applied to a curved screen, after the color filter substrate and the array substrate are bent, the relative positions of the two will be shifted, resulting in the metal layer in the array substrate being exposed on the co...

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Problems solved by technology

However, if the panel with this structure is applied to a curved screen, after the color filter substrate and the array substrate are bent, the relative positions of the two will be shifted, causing the metal layer in the array substrate to be exposed on the color filter substrate and formed by the black matrix. Metal light leakage occurs in the limited opening area

[0003] At present, due to the limitation of LTPS display panel process factors, it is difficult to use COA (Color filter on Array) technology to improve this problem. The only way to reduce the possibility of metal layer exposure in the opening area is to reduce the area of ​​the opening area. However, due to The pixel density of the LTPS display panel is relatively high, and the opening area of ​​a single sub-pixel is inherently small. Improving the phenomenon of metal light leakage by sacrificing the aperture ratio will have a great impact on the display of the LTPS display panel.

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