Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Equal-gap gradient increasing concentric circle type double-sided silicon drift detector and design method thereof

A silicon drift detector and gradient increasing technology, applied in the field of pulsar X-ray detection, can solve the problems of the difficulty of SDD arrays, the inability of SDD electrons to drift smoothly, and the high cost

Active Publication Date: 2020-07-03
XIANGTAN UNIV
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the embodiments of the present invention is to provide an equal-gap gradient-increasing concentric double-sided silicon drift detector to solve the problem that the existing SDD unit area is small and it is difficult and costly to splice into an SDD array, and the existing SDD The problem that electrons cannot drift smoothly to the cathode

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Equal-gap gradient increasing concentric circle type double-sided silicon drift detector and design method thereof
  • Equal-gap gradient increasing concentric circle type double-sided silicon drift detector and design method thereof
  • Equal-gap gradient increasing concentric circle type double-sided silicon drift detector and design method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0081] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0082] This embodiment provides a concentric circular cylindrical double-sided silicon drift detector with a large area and equal gap with a gradient increasing by the square of the radius R. Its structure is as follows figure 1 As shown, it includes a silicon substrate 5, the upper surface of the silicon substrate 5 is etched with a front concentric circular cathode ring 2, the lower surface of the silicon substrate 5 is etched with a reverse concentric circul...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an equal-gap gradient increasing concentric circle type double-sided silicon drift detector and a design method thereof. The equal-gap gradient increasing concentric circle type double-sided silicon drift detector comprises a silicon substrate, a front concentric circle type circular cathode ring is etched on the upper surface of the silicon substrate, and a reverse concentric circular cathode ring is etched on the lower surface of the silicon substrate. Each of the front concentric circle type circular cathode ring and the back concentric circle type circular cathode ring consists of a plurality of circular cathode rings which are sequentially sleeved from inside to outside. The gaps between two adjacent circular cathode rings in the two circular cathode rings areequal, and the distances between the two adjacent circular cathode rings are sequentially increased in a gradient manner from inside to outside, specifically, the distances are increased in a gradientmanner of power of two thirds of the inner radius of the internal circular cathode ring. The front concentric circle type circular cathode ring is the same in structure and size, and a front anode electrode is etched in the first ring. The problems that an existing SDD unit is small in area, large in array splicing difficulty and high in cost are solved.

Description

technical field [0001] The invention belongs to the technical field of pulsar X-ray detection, and relates to a design method of a concentric circular cylindrical double-sided silicon drift detector with a large-area equal gap and a gradient increasing by the square of the radius. Background technique [0002] With the development of science and technology, the development of semiconductor materials and process technology is advancing by leaps and bounds, the traditional detector technology is becoming more and more perfect, and more and more new material semiconductor detectors have entered people's field of vision. Among a large number of semiconductor detectors, silicon detectors are widely used in high-energy physics, nuclear physics and other fields because of their superior performance and mature and advanced process technology. At present, in the research field of silicon detectors, the effects of parameters such as depletion voltage, capacitance, dark current, and ch...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/115H01L31/0224H01L31/18
CPCH01L31/115H01L31/022416H01L31/1804Y02P70/50
Inventor 李正路顺茂刘曼文
Owner XIANGTAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products