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A mask cooling device and lithography equipment

A technology of cooling device and lithography equipment, which is applied to microlithography exposure equipment, optomechanical equipment, photolithography process exposure equipment, etc., can solve problems such as poor cooling effect of mask plate, etc., and achieve the effect of improving cooling effect

Active Publication Date: 2021-11-02
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, practice has shown that the cooling effect of the above-mentioned purging method on the mask plate is not good.

Method used

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  • A mask cooling device and lithography equipment
  • A mask cooling device and lithography equipment
  • A mask cooling device and lithography equipment

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Embodiment Construction

[0045] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.

[0046] figure 1 is a schematic structural diagram of a mask cooling device provided by an embodiment of the present invention, figure 2 is a schematic structural diagram of another mask cooling device provided by an embodiment of the present invention. Specifically, please refer to figure 1 and figure 2 , the mask plate cooling device includes a support frame 102 and a hollow area 101 defined by the support frame 102, the support frame 102 includes at least one air outlet 103 and an air inlet 104 correspondin...

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PUM

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Abstract

The invention discloses a mask plate cooling device and photolithography equipment. The mask plate cooling device includes a support frame and a hollow area defined by the support frame, the support frame includes at least one air outlet and an air inlet corresponding to and connected to each air outlet; the support frame includes a first surface for supporting the mask plate and It is used to define the inner surface of the hollow area. The air outlet is located at the junction of the first surface and the inner surface. The air outlet is in the shape of a long strip. The curtain is parallel to the mask plate, wherein the airflow ejected from the air outlet flows along the direction of the support frame pointing to the hollow area. The mask plate cooling device provided by the embodiment of the present invention can improve the cooling effect of the mask plate.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of lithography equipment, and in particular, to a mask plate cooling device and lithography equipment. Background technique [0002] In the exposure stage of the lithography machine, laser light is usually used to irradiate the mask. The mask plate includes a metal chromium layer. After the metal chromium layer absorbs the laser light, the temperature of the entire mask plate is likely to rise accordingly, causing deformation of the mask plate, thereby affecting the precision of photolithography and the yield of products. Therefore, the temperature control of the mask plate is very important for the photolithography precision. [0003] In order to avoid the heating of the mask plate caused by laser irradiation, the existing technology usually uses an air bath to purge the entire mask plate machine in an air bath, so that the air flow flows from the side of the mask plate away from the ...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/70875
Inventor 郝保同颜小龙李文东
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD