Photocatalytic device

Abstract

In the present invention, a photocatalytic device is formed by providing a gas inflow part and a gas outflow part for a gas at both end positions of a photocatalytic filter instead of providing a gasinlet-side flow channel and a gas outlet-side flow channel at positions facing the filter surface, while maintaining the contact area between the gas and the filter surface by adopting a waveform member as the photocatalytic filter and causing the gas to flow in the direction in which the ridges and valleys extend, over the front and rear surfaces of the filter from one end to the other end. Accordingly, there is no increase in flow resistance of the gas, the device can be made smaller by thinning the device, reducing the diameter, or the like, light irradiation efficiency can be improved, energy consumption and costs can be reduced, and the problem of heat can be resolved with a simple structure.

Description

technical field [0001] The present invention relates to a photocatalyst device including a photocatalyst filter carrying a photocatalyst, and a photoirradiation unit for irradiating ultraviolet light or visible light to the surface of the photocatalyst filter. Background technique [0002] As such a photocatalyst device, the following photocatalyst device is proposed, which includes: a box in which gas can flow; a photocatalyst filter arranged in the box; and a light irradiation unit having a plurality of light emitting diodes mounted on a substrate. On the other hand, the first and second irradiation units that irradiate the surface of the photocatalyst filter with light are alternately arranged side by side (for example, refer to Patent Document 1). [0003] Like this, the existing photocatalyst device all is to light-irradiate the filter surface of the photocatalyst filter while allowing gas (gas) to pass through the air hole of the photocatalyst filter, and the photocata...

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Problems solved by technology

Thus, in the existing photocatalyst device, on both sides of the photocatalyst filter, the flow path on the inlet side and the flow path on the outlet side of the vent hole are used to make gas (gas) pass through each filter without stagnation. The entire area of ​​the filter surface must be set on the opposite side, and the device size in the thickness direction of the filter becomes large

[0004] Moreover, in the flow path on the inlet side or the outlet side, an irradiation part for irradiating the filter surface with light must also be provided, and the irradiation part must not hinder the flow of gas. The structure of light irradiation with gas flow resistance tends to become complicated, which becomes a cause of cost increase, and there is a limit in improving the efficiency of light irradiation, and the power consumption to ensure the amount of light irradiation increases, and the amount of heat generated also increase the problem

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