A kind of polishing system and polishing method

A support table and operation table technology, applied in the field of polishing, can solve the problems of low polishing efficiency, high scrap rate, and relatively high requirements for length and width dimension accuracy, and achieve the effects of improving polishing efficiency, reducing scrap rate, and reducing idle rate

Active Publication Date: 2022-04-26
NICROTEK +1
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The traditional polishing technology is to directly stack the base materials of the light guide plate to be polished, and fix them with a baffle for processing. Because the base material of the light guide plate is provided with a boss with a height of about 1 mm, such as image 3 As shown, the base material of the stacked light guide plate is easy to tilt, so that only a small amount of products can be processed each time, and due to the relatively high requirements for the length and width of the polished products, the product rejection rate is relatively high
At present, 10 pieces of light guide plate substrates are generally stacked and then polished, the scrap rate is 40%-50%, the polishing efficiency is low, and the scrap rate is high, which cannot meet the production needs

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of polishing system and polishing method
  • A kind of polishing system and polishing method
  • A kind of polishing system and polishing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] Attached below Figure 1-6 The technical solution of the present invention is described in detail with the embodiment, wherein: 100, support platform; 101, protective plate; 102, positioning groove; 200, operating platform; Support platform; 301, lifting platform; 302, guide rod; 303, operating handle; 400, correction platform; 401, correction hole; 500, storage platform; 501, gravity piece; 600, product;

[0035] Polishing Fixtures

[0036] In the first embodiment, the present invention provides a polishing fixing device, which can fix sheet-shaped products to be polished with positioning holes together, and then polish the products by polishing equipment.

[0037] Such as figure 1 As shown, it is a three-dimensional schematic view of the polishing fixture provided by the first embodiment of the present invention, including a support table 100, and an operation table 200 detachably and fixedly connected with the support table 100. The operation table 200 is provided...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
heightaaaaaaaaaa
Login to view more

Abstract

The invention discloses a polishing system and a polishing method. The polishing system includes a polishing fixing device and polishing equipment, which can polish stacked sheet-shaped products to be polished, and each product to be polished is provided with a positioning hole for positioning . The purpose of the present invention is to provide a polishing system and a polishing method. After the polishing fixing device of the polishing system fixes hundreds of products, the polishing equipment can polish hundreds of products at one time, which greatly reduces the polishing efficiency while improving the polishing efficiency. The scrap rate of polished products is guaranteed, and the scrap rate is as low as about three thousandths.

Description

technical field [0001] The invention relates to the field of polishing, in particular to a polishing system and a polishing method. Background technique [0002] The production process of the light guide plate: the substrate (usually optical grade acrylic or PC sheet) is cut into a fixed size, and then the cut substrate is polished to a precise size, and finally on the bottom surface of the substrate Use laser engraving, V-shaped cross grid engraving, UV screen printing and other technologies to print the light guide dot structure. [0003] The traditional polishing technology is to directly stack the base materials of the light guide plate to be polished, and fix them with a baffle for processing. Because the base material of the light guide plate is provided with a boss with a height of about 1 mm, such as image 3 As shown, the base material of the stacked light guide plate is easy to tilt, so that only a small amount of products can be processed each time, and due to the...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): B24B29/06B24B41/06
CPCB24B29/06B24B41/068
Inventor 方宗豹张恒霍乐毅李云周何钊陈林森
Owner NICROTEK
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products