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Chemical delivery system and method of operating the chemical delivery system

A delivery system and chemical technology, applied in gaseous chemical plating, coating, metal material coating process, etc.

Pending Publication Date: 2020-08-07
ENTEGRIS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The use of solid precursors is especially challenging in terms of sublimation and subsequent delivery of the precursor vapor to the substrate

Method used

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  • Chemical delivery system and method of operating the chemical delivery system
  • Chemical delivery system and method of operating the chemical delivery system
  • Chemical delivery system and method of operating the chemical delivery system

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Embodiment Construction

[0020] As used in this specification and the appended claims, the singular forms "a", "an" and "the" include plural referents unless the content clearly dictates otherwise. As used in this specification and the appended claims, the term "or" is generally employed in its sense including "and / or" unless the content clearly dictates otherwise.

[0021] The following detailed description should be read with reference to the accompanying drawings in which like elements in different drawings are numbered the same. The detailed description and the drawings, which are not necessarily to scale, depict illustrative embodiments and are not intended to limit the scope of the invention. The illustrative embodiments depicted are intended to be exemplary only. Selected features of any illustrative embodiment may be incorporated into additional embodiments unless explicitly stated to the contrary.

[0022] first reference figure 1 , shows a CVD system 100 constructed in accordance with the...

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Abstract

A chemical delivery system includes a bulk container, a run / refill chamber, a first conduit and a second conduit. The bulk container stores a precursor. The run / refill chamber includes a plurality ofspaced tubes having a plurality of surfaces for receiving the precursor in vapor form and storing the precursor in solid form. The first conduit connects the bulk container to the run / refill chamber for transporting the precursor from the bulk container to the run / refill chamber in vapor form. The second conduit connects the run / refill chamber to a deposition chamber for transporting the precursorfrom the run / refill chamber to the deposition chamber in vapor form.

Description

technical field [0001] The present invention generally relates to a chemical delivery system, particularly a chemical delivery system for use in a chemical vapor deposition process. Background technique [0002] Chemical vapor deposition (CVD) is a chemical process used to deposit thin films of materials on substrates. Typically, for example in the semiconductor industry, films are deposited on silicon wafers. During the process, the wafer is exposed to one or more precursors that react or decompose and are thus deposited on the wafer in a deposition chamber. A more specific subclass of CVD is atomic layer deposition (ALD). In ALD, two precursors are typically used and deposited on the wafer in an alternating fashion. The precursors are never all present in the deposition chamber at the same time. Precursors for the CVD process can be stored in gaseous, liquid or solid form. The use of solid precursors is particularly challenging in terms of sublimation and subsequent d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/448H01L21/67H01L21/02
CPCC23C16/4487C23C16/45561C23C16/45523C23C16/52C23C16/45525C23C16/4481C23C16/45544C23C16/45512H01L21/02271H01L21/67017
Inventor 大卫·詹姆斯·埃尔德里奇大卫·彼得斯小罗伯特·赖特布赖恩·C·亨德里克斯斯科特·L·巴特尔约翰·格雷格
Owner ENTEGRIS INC