Semiconductor deposition process compensating method, compensating device and semiconductor deposition equipment
A technology of deposition process and compensation method, which is applied in the direction of metal material coating process, ion implantation plating, coating, etc., can solve the problems of inflexibility and incomplete parameter compensation method, and achieve the effect of low fitting difficulty
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[0043] The present invention will be described in more detail below with reference to the accompanying drawings. Although preferred embodiments of the invention are shown in the drawings, it should be understood that the invention may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art.
[0044] An embodiment of the present invention provides a semiconductor deposition process compensation method, figure 2 A flow chart of the steps of a semiconductor deposition process compensation method according to an embodiment of the present invention is shown. Please refer to figure 2 , the semiconductor deposition process compensation method includes the following steps:
[0045] Step 1: Before executing the current process step, judge whether it is necessary to perform para...
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