TFT-LCD substrate glass kiln environment control device and method
A glass furnace and control device technology, applied in glass furnace equipment, glass manufacturing equipment, manufacturing tools, etc.
Active Publication Date: 2020-08-25
IRICO
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Problems solved by technology
[0004] The purpose of the present invention is to overcome the shortcomings of the above-mentioned prior art, and provide a TFT-LCD substrate glass kiln environment control device and control method to solve the problem of qualitative and quantitative control of the airflow direction and size of the hot-end equipment area environment
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[0029] The present invention is described in further detail below in conjunction with accompanying drawing:
[0030] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, or in a specific orientation. construction and operation, and therefore cannot be construed as limiting the present invention; the terms "first", "second", and "third" are used for descriptive purposes only, and cannot be construed as indicating or implying relative importance; in addition, unless otherwise Clearly stipulated and limited, the terms "installation"...
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The invention discloses a TFT-LCD substrate glass kiln environment control device and method. The device comprises a platinum channel and a kiln which are connected with each other, wherein the platinum channel and the kiln are located in a glass kiln, and the glass kiln is located in an external atmospheric environment; the platinum channel is arranged at the rear end of the glass kiln; the external atmospheric environment is arranged outside a kiln area and a channel closed area; independent space pressure bins are formed among the areas; an air inlet device and an air exhaust device are respectively arranged at the front end part and the rear end part of the glass kiln; an air inlet device and an air exhaust device are respectively arranged at the front end part and the rear end part ofa channel area; and the kiln area and the channel area are enabled to permeate into the external atmosphere, the air speed and environment pressure differences of the front end face and the rear endface of the glass kiln are controlled, the air speed and environment pressure differences of the front end face and the rear end face of the channel area are controlled, environment airflow in the kiln area and the channel area is consistent with the flow direction of molten glass, and sectional air speed, pressure difference and air distribution meeting process production requirements are achieved.
Description
【Technical field】 [0001] The invention belongs to the field of HVAC air conditioning and TFT substrate glass production, and in particular relates to a TFT-LCD substrate glass kiln environment control device and control method. 【Background technique】 [0002] In the production process of TFT substrate glass, the change of the ambient airflow direction in the hot-end equipment area has a great impact on the entire production process. In industrial production, the ambient airflow direction and size in the hot-end equipment area have been listed as important process control parameters. At present, in domestic and foreign industrial production, there is no complete qualitative standard for the airflow direction and size of the hot-end equipment area environment. Moreover, in the production process of TFT substrate glass, the equipment in each forming area is built and used in a factory building or a separate factory building, and the air flow of the hot-end equipment is not qual...
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IPC IPC(8): C03B5/16
CPCC03B5/16
Inventor 赵宇峰孙钢智张涛张生明韩永荣
Owner IRICO