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Method for optimizing rotation parameters in mask rotary gluing

A technology of rotation parameters and optimization methods, which is applied in photoplate-making process coating equipment, patterned surface photoplate-making process, optics, etc., can solve the problems of low efficiency and high cost, and achieve the effect of reducing test cost and high efficiency of the method

Active Publication Date: 2020-08-28
成都路维光电有限公司
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Problems solved by technology

[0007] In order to solve the technical problems of low efficiency and high cost of the traditional screening method, the present invention provides a method for optimizing the rotation parameters in the high-generation mask rotation coating

Method used

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  • Method for optimizing rotation parameters in mask rotary gluing
  • Method for optimizing rotation parameters in mask rotary gluing
  • Method for optimizing rotation parameters in mask rotary gluing

Examples

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Embodiment

[0054]This embodiment takes the G11 generation mask as an example, the size of the G11 generation mask is 1620mm*1780mm*17mm, and the weight of the G11 generation mask substrate is >100Kg. refer to figure 1 , figure 1 It is the distribution map of the coating color difference on the mask plate substrate under normal spin coating process conditions. It can be seen that the color difference is relatively large, and it exists on the edge of the mask plate substrate, mostly in the shape of an approximate triangle or parabola.

[0055] refer to figure 2 , image 3 and Figure 4 , rotation parameter optimization method in mask plate rotation gluing of the present invention, comprises the following steps:

[0056] S1 establishes the mask plate model, selects the rotation parameters that affect the mask plate spin coating process and the target parameters for evaluating the mask plate glue coating quality;

[0057] Wherein, the rotation parameter comprises the rotation speed rpm...

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Abstract

The invention discloses a method for optimizing rotation parameters in mask spin-coating, which comprises the following steps of: S1, establishing a mask model, and selecting rotation parameters influencing a mask spin-coating process and target parameters for checking the mask glue-coating quality; wherein the rotation parameters comprise the rotation speed rpm of the gluing turntable, the rotation time t of the gluing turntable and the rotation acceleration a of the gluing turntable; wherein the target parameters are a film thickness average value, film thickness uniformity and color difference; s2, endowing each rotation parameter with a plurality of parameter values, and establishing an orthogonal table for the parameter values and the target parameters; s3, endowing each group of parameter values in the orthogonal table to a coating turntable, carrying out rotary gluing on the mask, and finally calculating a target parameter value corresponding to each group of parameter values inthe orthogonal table; s4, selecting an optimal group of rotation parameters from the orthogonal table; compared with a traditional screening method needing a large number of tests, the optimal rotation parameters can be obtained through the method, the method is more efficient and reliable, and meanwhile the test cost is greatly reduced.

Description

technical field [0001] The invention relates to the technical field of mask plate manufacturing, in particular to a rotation parameter optimization method for high-generation mask plate spin coating. Background technique [0002] The mask plate is also called photomask, photomask plate, (English name Photo Mask, referred to as Mask), it is the most important core key material in the flat panel display manufacturing process, and it plays an important role in the exposure process in the photolithography process of flat panel display device manufacturing. The masking effect directly determines the quality of flat panel display terminal products. [0003] In recent years, my country's display panel industry has developed very rapidly, especially in the field of high-end panels such as G11, and has become a leader in global industrial development. As a key core material in flat panel display manufacturing, masks are also in increasing demand as the scale of the flat panel displa...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/16G03F1/68
CPCG03F7/162G03F1/68Y02P90/30
Inventor 林伟林超
Owner 成都路维光电有限公司
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