14 results about "Spin speed" patented technology

The present disclosure relates to a component having a main body that is provided with a coating, wherein the coating has a plurality of coating segments which extend about an axis of rotation of the component extending in the circumferential direction of the component and at least partially spaced apart from one another, by means of which coating segments a rotational speed of the component rotating about the axis of rotation can be detected.

The utility model relates to the technical field of vacuum coating, and discloses a vacuum coating clamping device which comprises a fixing plate, the fixing plate is rotationally sleeved with a supporting pipe, the pipe wall of the supporting pipe is symmetrically and fixedly connected with a plurality of telescopic air pipes, and the ends, away from the supporting pipe, of the telescopic air pipes located on the same side are fixedly connected with the same abutting plate. A motor rotating assembly used for driving the supporting pipe to rotate is fixedly installed at the lower end of the fixing plate, and a pressurizing mechanism is fixedly installed at the lower end of the fixing plate. The problem that the coating quality is affected by overlarge centrifugal force and vibration due to the fact that the overhigh rotating speed is not suitable for workpieces with large sizes is solved.

The invention relates to a vacuum coating installation (1) for coating three-dimensional substrates (6), comprising: an evacuable coating chamber (2), which has a first coating region (7.1) for rotatably receiving a substrate (6); a first source arrangement (8.1), which is directed in a first main direction (10.1) onto the first coating region (7.1) and has at least one coating source (9.1, 9.2, 9.3); a second source arrangement (8.2), which is directed in a second main direction (10.2) onto the first coating region (7.1) and has at least one coating source (13.1, 13.2, 13.3); and means (16) for measuring a spacing between the second source arrangement (8.2) and the substrate (6), wherein main directions (10.1, 10.2) are at a first angle of at least 45° to one another and the power consumption of the second source arrangement (8.2) and / or the rotational speed of the substrate (6) can be controlled and / or regulated corresponding to the measured spacing between the second source arrangement (8.2) and the substrate (6). The invention also relates to a method (30) for coating a three-dimensional substrate (6) using a vacuum coating installation (1).

The invention provides a spraying film type coating and an application mode thereof. The spraying film type coating is different from the traditional fogdrop type spraying coating, has high low shear viscosity and solid content, high extension rheological property and low dynamic surface tension, is sprayed out in the form of a film by adopting a nozzle with a gap structure, and uniformly covers the surface of an implement. The coating thickness is controlled through the flow of a conveying pump, the width of a nozzle gap, the rotating speed of a sprayed object, the moving speed of a gap nozzle and the like. In the spraying process, the utensil rotates at a certain speed, the gap nozzle linearly moves at a constant speed in the direction parallel to the rotating face or adjusts the dip angle of the nozzle, a coating film with a certain thickness can evenly sweep the surface of the utensil, and spraying is completed. The characteristics of the coating are opposite to those of traditional fogdrop type spraying coating, the coating is not prone to being atomized into liquid drops, and the problems that in the traditional spraying process, fogdrop coverage is uneven, fogdrops are prone to drying, a spray head is prone to being blocked, and waste of the coating is large can be effectively solved.

The invention discloses a waxy surface mounting process for reducing damage to the back surface of a silicon wafer. The process comprises the following steps: firstly, placing a silicon wafer in automatic wax pasting equipment, and enabling liquid wax to form a uniform covering layer on the back surface of the silicon wafer by accurately controlling the single wax spraying amount to be 2-5mL and combining a centrifugal wax throwing process of 1500-3500rpm; then, feeding the silicon wafer into a baking unit at 150-350 DEG C, removing the solvent, solidifying the wax layer, and keeping the temperature of the back surface of the silicon wafer at 70-120 DEG C; and finally, accurately attaching the silicon wafer to a special ceramic carrier plate with the surface roughness Ra of 0.2-1.5 microns and the surface temperature of 50-80 DEG C by adopting a 10-50kPa flexible air pressure pressing system, and carrying out waxy single-side polishing after the surface mounting is completed. According to the invention, key process parameters such as wax spraying amount, wax throwing rotating speed, baking temperature, laminating pressure and the like are optimized by the system, so that the thickness and uniformity of a wax layer are accurately controlled, and the damage rate of the back surface of the silicon wafer in the wax laminating process is obviously reduced, thereby effectively improving the yield of silicon wafer manufacturing.

The application belongs to the technical field of semiconductor manufacturing, and discloses a preparation method of a high-fidelity photoresist pattern. The method comprises the steps of spin coating, pre-baking, exposure, post-exposure baking and development. The development step comprises: applying a developing solution to the surface of a substrate at a first rotation speed to preliminarily develop the photoresist; adjusting the substrate to a second rotation speed, which is lower than the first rotation speed, to partially remove the developing solution; applying the developing solution to the surface of the substrate while the substrate is in a stationary state, and performing main development while the substrate is kept in the stationary state; and again applying the developing solution to the surface of the substrate while the substrate is in a stationary state, and performing supplementary development while the substrate is kept in the stationary state. The application solves the problems of pattern distortion and shrinkage in the traditional process by using a segmented development process, improves the fidelity and process stability of the photoresist pattern, and has good industrial application value without the need to increase special materials or complex equipment.

The utility model relates to the field of hollow glass coating, and discloses a coating device for a self-cleaning coating on the surface of hollow glass, which comprises a processing table, a support is slidably connected to the top of the processing table, a transmission mechanism B is arranged on the support, a brushing mechanism is arranged on the outer wall of the support, a coating mechanism is arranged on the support, and the transmission mechanism B is arranged on the coating mechanism. And the brushing mechanism comprises a rotating rod, the outer wall of the rotating rod is rotationally connected to the inner wall of the support, a rotating disc B is fixedly connected to the outer wall of the left side of the rotating rod, a hand wheel is fixedly connected to the outer wall of the right side of the rotating rod, and a limiting rod is fixedly connected to the top of the machining table. According to the self-cleaning coating spraying device, the transmission mechanism A is arranged, the motor drives the rotating disc A to rotate, when the rotating disc A rotates, the protruding blocks on the outer wall of the rotating disc A extrude the oval blocks, the self-cleaning coating is sprayed to the surface of hollow glass, and the spraying speed can be adjusted according to the rotating speed of the rotating disc A.

Provided is a coating method capable of causing a coating material to easily adhere to pointed ends of center members.　This coating method is a method for coating, with the coating material, the center members of subjects to be coated. This coating method includes a pointed end coating step in which a rotary shaft (C) of a coating tank (25) is inclined with respect to the vertical direction, the rotation direction of a rotary disk (38A) is configured to be opposite to the rotation direction of a drum (28A), the rotary disk (38A) and the drum (28A) are rotated in such a manner that the rotation speed of the rotary disk (38A) is higher than the rotation speed of the drum (28A) so as to thereby cause, on a center member group (CG) formed from the plurality of center members, a first circulating flow movement in the form of a vortex flow around the axis of the coating tank (25) and a second circulating flow movement in the form of a vertical spiral flow that is lifted forward in the rotation direction and that subsequently falls due to its own weight, and the coating material is added to a merging portion of these flow movements so as to coat at least the pointed ends of the center members.

In a coating method according to an unlimited aspect of the present disclosure, a cutter is rotated about a rotation axis parallel to a revolution axis while revolving about the revolution axis, and a coating layer is applied to the surface of the cutter by a physical vapor deposition method, a revolution table for revolution of a cutter and a rotation table for rotation of the cutter on the revolution table are used. When the rotation speed of the revolution table is a (rpm) and the rotation speed of the rotation table is b (rpm), the ratio b / a of a and b is greater than 2 and is not an integer.

The invention discloses a coating method for improving rotation MURA of a TFT-LCD color filter. The coating method comprises the following steps of photoresist preparation, wherein photoresist with the viscosity ranging from 2.8 cP to 3.2 cP is provided; the photoresist is dropwise added to the surface of the glass substrate, spin coating is carried out at the rotation speed N, the rotation speed N is cooperated with the viscosity of the photoresist, and the rotation speed reduction amplitude of the rotation speed N relative to the original rotation speed N is controlled within the range of 50-100 rpm. Therefore, the viscosity of the photoresist is reduced, and the rotating speed of coating is synchronously reduced, so that the viscosity of the photoresist and the rotating speed of coating are cooperatively matched, the viscous resistance of a photoresist solution can be reduced, the excessive stretching effect of a centrifugal force is weakened, the formation of a film thickness gradient is avoided, and the defects of bright and dark stripes of a rotating MURA are greatly reduced; and meanwhile, the film thickness uniformity can be improved without modifying existing equipment, the stability of subsequent procedures is guaranteed, and the manufacturing cost is reduced.

The present application relates to a kind of spinneret suitable for elastomer material and its application in the preparation of elastic fiber, spinneret channel from top to bottom includes smooth transition guide hole, spinneret hole and spinneret hole outlet, guide hole is composed of smooth transition guide hole channel and elastic property weakening area, guide hole channel is hollow cylinder with solid cylindrical filler in center, elastic property weakening area is hollow circular platform shape with upper large and lower small, spinneret hole is hollow cylinder, guide hole channel, elastic property weakening area and spinneret hole whole longitudinal section presents Y type;Application is: using the above-mentioned spinneret to melt spinning and obtaining elastic fiber;Wherein, spinning speed is 2000-4000 m / min.The present application reduces the melt rupture and relieves the phenomenon of off-die expansion of high-elastic polymer when melt spinning, and the spinning speed is high when applied in the preparation of elastic fiber.

The present application provides a method for manufacturing a laminate, which can stably manufacture a laminate including a coating layer having a desired thickness. A method for manufacturing a laminate according to one embodiment includes: a coating step of coating a coating agent on a substrate being conveyed using a coating roll to form a coating layer on the substrate, the coating agent being coated on the substrate based on a ratio of a rotation speed of the coating roll to a conveyance speed of the substrate, i.e., a coating draw ratio; a thickness acquisition step of acquiring a thickness of the coating layer; a calculation step of calculating a difference between the thickness of the coating layer and a prescribed thickness; and a change step of changing the coating draw ratio in the coating step based on the difference between the thickness of the coating layer and the prescribed thickness, the coating step, the thickness acquisition step, the calculation step, and the change step being repeatedly performed while automatically implementing the coating step, the thickness acquisition step, the calculation step, and the change step.

The invention provides corresponding embodiments of a ball serving device, a ball serving system and a ball serving device control method. The ball serving device comprises a supporting frame, a ball serving execution piece and a self-rotation driving mechanism. A serving fairway is arranged on the support frame; the ball serving execution piece and the ball serving channel form a bearing table used for bearing balls. The self-rotating driving mechanism comprises a power source and a driving wheel, and the driving wheel is connected with the power source; the driving wheel is located at the ball serving channel and makes contact with the ball on the bearing table to drive the ball to spin. According to the technical scheme, the ball serving execution piece and the ball serving channel form the bearing table for bearing the ball, the self-rotating driving mechanism is arranged at the ball serving channel to drive the ball to rotate automatically, and the situation that the ball rotates at a differential speed rubs the spherical surface of the ball does not exist while the ball obtains a high self-rotating speed.

A method for coating small parts with a coating device, the coating device comprising a rotatably mounted receptacle in which the small parts are received during coating, a material feed through which coating material is supplied at least temporarily during coating, a drying device with which the coating material is dried on the small parts, and an extraction system which causes a fluid volume flow from the receptacle to an external space at least temporarily during coating, wherein the method comprises controlling at least one of the following based on a predetermined layer characteristic of the coating: a solids content of the coating material, a feed rate of the coating material, an extraction rate of the extraction system, a radiation power of the irradiation device, a rotational speed of the receptacle, and an inclination of the receptacle.