Diamond polishing solution and preparation method thereof

Abstract

The invention provides a diamond polishing solution for metallographic polishing and capable of meeting different polishing precision requirements and a preparation method thereof. The diamond polishing solution is prepared from the following raw materials in parts by weight: 70-95 parts of water, 0.1-15 parts of diamond micro powder, 2-5 parts of a suspending agent, 0.01-0.1 part of an antioxidant, 10-20 parts of a lubricant, and 1-5 parts of a dispersant; the preparation method of the diamond polishing solution comprises the following steps: adding the dispersing agent, the lubricating agentand the diamond micro-powder sequentially into stirred water; adding an antioxidant into the water; under the condition that the stirring rotating speed is not lower than 800 rpm, adding a suspendingagent into water for dispersion for 20-30 min. The polishing solution provided by the invention is a water-based polishing solution, and has the characteristics of environmental protection, good suspension property, high polishing efficiency, good smooth finish of a polished surface, low cost and the like.

Description

technical field [0001] The invention belongs to the technical field of polishing fluid, and in particular relates to a diamond polishing fluid and a preparation method thereof. Background technique [0002] Diamond polishing liquid includes three different types of polishing liquids: polycrystalline, single crystal and nano. Diamond polishing liquid is composed of high-quality diamond micropowder, composite dispersant and dispersion medium, with various formulas, corresponding to different polishing processes and workpieces, and has strong applicability. The product has good dispersion, uniform particle size, complete specifications and stable quality, and is widely used in grinding and polishing of hard materials. [0003] In the prior art, such as the Chinese invention authorized patent whose application number is CN200510030024.2 discloses a water-based diamond polishing liquid and its preparation method, which needs to slowly add diamond micropowder to concentrated sulf...

AI Technical Summary

Problems solved by technology

[0003] In the prior art, such as the Chinese invention authorized patent whose application number is CN200510030024.2 discloses a water-based diamond polishing liquid and its preparation method, which needs to slowly add diamond micropowder to concentrated sulfuric acid with a concentration greater than 96% in the preparation process Ultrasonic or shear dispersion in medium, then heat the mixture of diamond micropowder and concentrated sulfuric acid to above 200°C and keep it for at least one hour, then stop heating, cool naturally to room temperature, and centrifuge to separate the diamond micropowder in the mixture; but due to concentrated sulfuric acid It is highly corrosive and severely corrodes equipment. In addition, concentrated sulfuric acid needs to be treated before it can be discharged, which increases production costs. If it is discharged without treatment, it will pollute the environment.

[0004] As another example, the Chinese invention authorized patent with the application number CN201610888626.X discloses a low-density magnetic particle and a high-suspension-stability water-based magnetorheological polishing fluid prepared therefrom. High-suspension-stability water-based magnetorheological polishing The liquid can remain in stable suspension for more than several months without settling, and this product is used for optical non-planar polishing, and the surface roughness can reach Ra below 10nm after polishing; but with the continuous improvement of processing precision requirements, it cannot meet more demanding