Resin structure

A structure and resin technology, applied in textiles and papermaking, biochemical fiber treatment, yarn, etc., can solve the problem of small deformation of piezoelectric fibers and achieve high-efficiency deformation

Pending Publication Date: 2020-09-29
MURATA MFG CO LTD
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, even if the yarn or cloth equipped with piezoelectric fibers is deformed, since the piezoelectric fibers can move freely in the gap, there are cases where the deformation of the piezoelectric fibers themselves is small or not.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Resin structure
  • Resin structure
  • Resin structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] figure 1 (A) is a partial exploded view showing the structure of the resin structure 1, figure 1 (B) is figure 1 (A) Cross-sectional view of line A-A.

[0018] The resin structure 1 includes a plurality of piezoelectric fibers 10 and an insulating resin 100 . Each of the plurality of piezoelectric fibers 10 is a fiber having a circular cross section. The plurality of piezoelectric fibers 10 rotate counterclockwise and are mutually twisted to form a counterrotating yarn (hereinafter referred to as S yarn). In addition, in the present embodiment, the resin structure 1 obtained by twisting seven piezoelectric fibers 10 is shown as an example, but the number of piezoelectric fibers 10, the number of twists, and the number of filaments are actually based on Set it appropriately according to the usage etc.

[0019] The insulating resin 100 is formed to cover the entirety of the twisted piezoelectric fibers 10 . However, the resin structure 1 only needs to cover at least...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A resin structure (1) is provided with: multiple piezoelectric fibers (10) which, with external energy, generate an electric charge; and an insulating resin (100). At least one of the multiple piezoelectric fibers (10) is formed coated with the insulating resin (100).

Description

technical field [0001] The present invention relates to a resin structure including piezoelectric fibers. Background technique [0002] Patent Document 1 discloses a charge-generating fiber that exhibits antimicrobial properties due to charges generated by the piezoelectric effect. [0003] Patent Document 1: Japanese Patent No. 6292368 [0004] There are many gaps between the fibers constituting the yarn or the cloth. Therefore, even if the yarn or cloth including piezoelectric fibers is deformed, since the piezoelectric fibers can freely move in the gap, there may be little or no deformation of the piezoelectric fibers themselves. Contents of the invention [0005] Therefore, an object of the present invention is to provide a resin structure capable of efficiently deforming piezoelectric fibers. [0006] The resin structure of the present invention includes a plurality of piezoelectric fibers that generate charges by external energy, and an insulating resin. The resi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): D06M15/00D02G3/36H01L41/113H01L41/193D06M101/32
CPCD06M15/55D06M15/507D06M15/263D06M15/564D02G3/441D10B2401/00D06M16/00H10N30/88H10N30/30H10N30/852H10N30/857H10N30/702D02G3/26D02G3/36
Inventor 兼松俊介宅见健一郎
Owner MURATA MFG CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products