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System and method for measuring Roll value of precision positioning platform

A technology of precision positioning and measurement system, applied in the field of measurement system of the Roll value of the precision positioning platform, can solve the problem that the error accuracy of the direct writing lithography exposure system cannot be effectively evaluated, the accuracy of the Roll value of the precision positioning platform cannot be guaranteed, and it is difficult to guarantee Direct writing lithography exposure equipment exposes problems such as pattern yield and achieves the effects of simple structure, low cost and easy operation

Active Publication Date: 2020-11-10
HEFEI CHIP FOUND MICROELECTRONICS EQUIP CO LTD
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  • Abstract
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  • Application Information

AI Technical Summary

Problems solved by technology

However, the laser interferometer is expensive, the assembly and debugging process is complicated, and the test environment is extremely demanding. It cannot guarantee the accuracy of the Roll value measurement of the precision positioning platform, and cannot effectively evaluate the Roll value of the precision positioning platform. The impact of the direct writing lithography exposure system Error accuracy, it is difficult to guarantee the yield of the exposure pattern of the direct writing lithography exposure equipment

Method used

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  • System and method for measuring Roll value of precision positioning platform
  • System and method for measuring Roll value of precision positioning platform
  • System and method for measuring Roll value of precision positioning platform

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Embodiment Construction

[0031] Embodiments of the present invention are described in detail below, and the embodiments described with reference to the drawings are exemplary, and embodiments of the present invention are described in detail below.

[0032] Refer below Figure 1-Figure 8 The system and method for measuring the Roll value of a precision positioning platform according to an embodiment of the present invention are described.

[0033] figure 1 It is a structural schematic diagram of a measurement system for a precision positioning platform Roll value according to an embodiment of the present invention. Such as figure 1 As shown, the measurement system 100 for the Roll value of the precision positioning platform includes: a measurement base 110 , a measurement module 120 and a calculation module 130 .

[0034] Wherein, the first axis of the precision positioning platform is installed on the measurement base 110 , and the second axis of the precision positioning platform is installed on t...

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Abstract

The invention discloses a system and method for measuring the Roll value of a precision positioning platform, and the system comprises a measurement pedestal which is provided with a first shaft of the precision positioning platform, wherein a second shaft of the precision positioning platform is disposed on the first shaft; a measuring module, wherein the measuring module is installed on the measuring pedestal and used for measuring distance values corresponding to all coordinate points on the first shaft and the second shaft of the precision positioning platform when the precision positioning platform moves; and a calculation module which is used for calculating Roll values corresponding to the coordinate points on the first shaft and the second shaft of the precision positioning platform according to the distances corresponding to the coordinate points on the first shaft and the second shaft. The Roll value of the precise positioning platform can be effectively measured, and the system has the advantages of being high in measurement result accuracy, simple in structure, easy and convenient to adjust, low in cost and high in working efficiency.

Description

technical field [0001] The invention relates to the technical field of precision positioning control, in particular to a measurement system and method for a Roll value of a precision positioning platform. Background technique [0002] The Roll value of the precision positioning platform is an important parameter to measure the dynamic characteristics of the precision positioning platform, including the accuracy level of the slide rail itself, the effect of the installation and debugging of the slide rail, the matching effect of the grating scale and the slide rail, and the structural rigidity of the installation base, etc. It is the main factor affecting the Roll value. The Roll value on the precision positioning platform mainly affects the dynamic flatness of the worktable. If the flatness is poor, it will cause the direct writing lithography machine to defocus during the exposure process, resulting in defects such as poor resolution of the exposure pattern. [0003] The t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B5/008G01B5/28
CPCG01B5/008G01B5/28
Inventor 李辉
Owner HEFEI CHIP FOUND MICROELECTRONICS EQUIP CO LTD