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A kind of production method of high-purity cis-1-chloro-3,3,3-trifluoropropene

A technology of trifluoropropene and production method, which is applied in the directions of organic chemistry method, chemical instrument and method, halogenated hydrocarbon disproportionation separation/purification, etc., to achieve the effects of good selectivity, easy acquisition and easy reaction

Active Publication Date: 2021-03-02
陕西宇极新材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The technical problem to be solved by the present invention is to solve the deficiency of HCFO-1233zd(Z) preparation technology in the background, to fill the blank of existing HCFO-1233zd(Z) separation and purification, and to provide a kind of raw material that is easy to obtain, with high conversion rate and good selectivity , the production method of HCFO-1233zd(Z) products with easy reaction control, convenient operation, simple process, safety and reliability, stable and continuous operation, and high product purity

Method used

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  • A kind of production method of high-purity cis-1-chloro-3,3,3-trifluoropropene

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0047] The HCFO-1233zd (E) crude product is passed into the first degassing tower, the filler is a metal Pall ring, the pressure of the first degassing tower is 0.30MPa, the temperature of the tower bottom is 80°C, and the temperature of the circulating cooling water at the top of the tower is 20°C. The temperature at the top of the tower is 38°C. The light components in the crude product of HCFO-1233zd(E) are withdrawn from the top of the first degassing tower and enter the front fraction tank. The content of light components in the tower still material is 0.03%. The material in the bottom of the first degassing tower enters the first rectification tower, and the packing is a metal Pall ring. The temperature is 54°C, HCFO-1233zd(E) and HF components are extracted from the top of the tower, and the purity of GC analysis is 99.6%. The material withdrawn from the top of the first rectification tower passes through the HF absorption tank to separate the HF components through conc...

Embodiment 2

[0049] The HCFO-1233zd (E) crude product is passed into the first degassing tower, the filler is a metal Pall ring, the pressure of the first degassing tower is 0.30MPa, the temperature of the tower bottom is 80°C, and the temperature of the circulating cooling water at the top of the tower is 20°C. The temperature at the top of the tower is 40°C. The light components in the crude product of HCFO-1233zd(E) are withdrawn from the top of the first degassing tower and enter the front fraction tank. The content of light components in the tower still material is 0.03%. The material in the bottom of the first degassing tower enters the first rectification tower, and the packing is a metal Pall ring. The temperature is 55°C, HCFO-1233zd(E) and HF components are extracted from the top of the tower, and the purity of GC analysis is 99.8%. The material withdrawn from the top of the first rectification tower is passed through the HF absorption tank to separate the HF components through c...

Embodiment 3

[0051] The HCFO-1233zd (E) crude product is passed into the first degassing tower, the filler is a metal Pall ring, the pressure of the first degassing tower is 0.28MPa, the temperature of the bottom of the tower is 81°C, and the temperature of the circulating cooling water at the top of the tower is 25°C. The temperature at the top of the tower is 37°C. The light components in the crude product of HCFO-1233zd(E) are withdrawn from the top of the first degassing tower and enter the front fraction tank. The content of light components in the tower still material is 0.03%. The material in the bottom of the first degassing tower enters the first rectification tower, the packing is metal structured packing, the pressure of the first rectification tower is 0.20MPa, the temperature of the bottom of the tower is 81°C, the temperature of circulating cooling water at the top of the tower is 25°C, and the temperature of the top of the tower is at 54°C, HCFO-1233zd(E) and HF components we...

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Abstract

The invention discloses a production method of high-purity cis-1-chloro-3,3,3-trifluoropropene. The method is a mixture produced by fluorinating 1,1,1,3,3-pentachloropropane The gas is separated and purified to obtain trans-1-chloro-3,3,3-trifluoropropene, and then the cis-trans mixed product is obtained through catalytic isomerization, and the high-purity cis product is obtained by separation and purification again. The invention adopts metal fluoride chloride or oxyfluoride chloride as the isomerization catalyst, separates the components in the mixed gas step by step, and adopts the method of combined rectification and adsorption to realize the production of high-purity cis-form products. The method of the present invention has the characteristics of high reaction conversion rate, good selectivity and easy reaction control in the isomerization reaction stage, and has the characteristics of high product purity and thorough separation in the separation and purification process; the process flow of the whole method is simple to operate, and the equipment requirements Low, continuous and smooth operation, suitable for industrial mass production applications.

Description

technical field [0001] The present invention relates to a gas phase preparation method for the production of high-purity Z-1-chloro-3,3,3-trifluoropropene (HCFO-1233zd(Z)), in particular to a method based on E-1-chloro-3, 3,3-Trifluoropropene (HCFO-1233zd(E)) is used as raw material, and HCFO-1233zd(Z) is prepared by isomerization reaction in the presence of metal chlorofluoride or metal oxyfluoride catalyst, and the resulting mixture The gas is separated, purified and collected to obtain a high-purity product of HCFO-1233zd(Z). Background technique [0002] 1-Chloro-3,3,3-trifluoropropene (hereinafter referred to as "1233zd") is considered as an environmentally friendly substitute for CFCs and has wide applications. US patent US2008 / 0098755, US patent 2008 / 0207788 and US patent 6362383 respectively report application examples of 1233zd as heat transfer medium, refrigerant and solvent. [0003] 1233zd exists as two isomers (E) and (Z) with different physical properties. F...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C07C17/00C07C17/358C07C17/38C07C21/18B01J27/138B01J27/132B01J27/128B01J27/125
CPCB01J27/125B01J27/128B01J27/132B01J27/138C07B2200/09C07C17/00C07C17/358C07C17/38C07C21/18
Inventor 庆飞要郭勤张呈平贾晓卿
Owner 陕西宇极新材料科技有限公司