Fluid director and epitaxial wafer manufacturing equipment
A technology for manufacturing equipment and epitaxial wafers, used in chemical instruments and methods, crystal growth, single crystal growth, etc., can solve the problems of by-product accumulation, affecting the quality of epitaxial wafers, etc. Effect
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[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0032] Please refer to image 3 , image 3 A top view of a deflector provided in Embodiment 1 of the present invention;
[0033] The present invention provides a deflector 20, which is applied to the exhaust component 10 of the epitaxial wafer manufacturing equipment. an air inlet and an exhaust channel 13 of the first air outlet for accommodating the deflector 20;
[0034] The deflector 20 includes a second air inlet 21 and a second air outlet 22 t...
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