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Fluid director and epitaxial wafer manufacturing equipment

A technology for manufacturing equipment and epitaxial wafers, used in chemical instruments and methods, crystal growth, single crystal growth, etc., can solve the problems of by-product accumulation, affecting the quality of epitaxial wafers, etc. Effect

Inactive Publication Date: 2020-11-17
XIAN ESWIN MATERIAL TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] An embodiment of the present invention provides a deflector and epitaxial wafer manufacturing equipment to solve the problem of accumulation of by-products and affecting the quality of epitaxial wafers when the epitaxial wafer manufacturing equipment is used

Method used

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  • Fluid director and epitaxial wafer manufacturing equipment
  • Fluid director and epitaxial wafer manufacturing equipment
  • Fluid director and epitaxial wafer manufacturing equipment

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Embodiment Construction

[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0032] Please refer to image 3 , image 3 A top view of a deflector provided in Embodiment 1 of the present invention;

[0033] The present invention provides a deflector 20, which is applied to the exhaust component 10 of the epitaxial wafer manufacturing equipment. an air inlet and an exhaust channel 13 of the first air outlet for accommodating the deflector 20;

[0034] The deflector 20 includes a second air inlet 21 and a second air outlet 22 t...

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Abstract

The invention provides a fluid director and epitaxial wafer manufacturing equipment, and relates to the field of epitaxial wafer preparation. The fluid director is applied to an exhaust part of the epitaxial wafer manufacturing equipment, and the exhaust part comprises a first air inlet and a first air outlet which are oppositely arranged, and an exhaust passage penetrating through the first air inlet and the first air outlet and used for accommodating the fluid director. The fluid director comprises a second air inlet, a second air outlet and a flow guide passage penetrating through the second air inlet and the second air outlet, wherein the second air inlet and the second air outlet are oppositely arranged, and the size of the flow guide passage is gradually reduced in the direction fromthe second air inlet to the second air outlet. The shape and the size of the second air inlet are matched with those of the first air inlet. According to the invention, the problem that the quality of an epitaxial wafer is influenced due to byproduct accumulation when the epitaxial wafer manufacturing equipment is used can be solved.

Description

technical field [0001] Embodiments of the present invention relate to the field of epitaxial wafer preparation, and in particular, relate to a deflector and epitaxial wafer manufacturing equipment. Background technique [0002] Epitaxial wafers are grown as single-crystal thin films on mirror-finished silicon wafers, which have fewer surface defects than existing single-crystal silicon wafers. The above-mentioned epitaxial wafer film has the advantages of high purity, excellent crystal characteristics, and improved number rate of solid semiconductor and characteristics of components. [0003] Epitaxial wafer basically uses Chemical Vapor Deposition (CBD) equipment to inject silicon-containing source gas in a high-temperature closed reaction furnace (Process chamber) into the surface of a single crystal silicon wafer, so that the single crystal is deposited on the surface and grows. [0004] See figure 1 , figure 1 It is a schematic diagram of the structure of an epitaxial...

Claims

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Application Information

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IPC IPC(8): C30B25/14
CPCC30B25/14
Inventor 金柱炫王力刘凯
Owner XIAN ESWIN MATERIAL TECH CO LTD
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