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Mask plate temperature control device and mask exposure device

A technology of temperature control device and mask plate, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, optics, etc., can solve the problems of low heat conduction and heat transfer efficiency, difficult temperature control of mask plate, etc., and reduce the difficulty of temperature control , Improve the effect of temperature stabilization efficiency

Active Publication Date: 2020-11-17
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the material of the mask plate is usually low-expansion quartz glass, and its heat conduction and heat transfer efficiency is low, which makes it difficult to control the temperature of the mask plate

Method used

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  • Mask plate temperature control device and mask exposure device
  • Mask plate temperature control device and mask exposure device
  • Mask plate temperature control device and mask exposure device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0050] figure 1 It is a schematic structural diagram of a mask temperature control device provided by an embodiment of the present invention. Reference figure 1 , The mask temperature control device 10 includes: a gas delivery unit 110, a gas temperature control unit 120 and a mask storage unit 130; the gas delivery unit 110 is used to deliver a gas bath gas to the mask storage unit 130, and the gas temperature control unit 120 is used The temperature variation range of the gas bath gas transferred from the gas delivery unit 110 to the mask storage unit 130 is adjusted to a preset temperature range; wherein, the mask storage unit 130 includes a plate holder main body 131 and a partition 132, and the partition 132 is fixed on In the main body 131 of the plate holder, an accommodation space is formed between two adjacent partitions 132, and the accommodation space is used for placing the mask.

[0051] Wherein, the gas delivery unit 110 transmits the gas bath gas from the gas suppl...

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Abstract

The invention discloses a mask plate temperature control device and a mask exposure device. The mask plate temperature control device comprises a gas temperature control unit, a gas conveying unit anda mask storage unit, wherein the gas conveying unit is used for conveying gas bath gas to the mask storage unit, and the gas temperature control unit is used for adjusting the temperature change range of the gas bath gas conveyed to the mask storage unit by the gas conveying unit to a preset temperature range; the mask storage unit comprises a plate frame main body and partition plates, the partition plates are fixed in the plate frame main body, a containing space is formed between every two adjacent partition plates, and the containing spaces are used for containing mask plates. According to the technical scheme, the temperature control difficulty of the mask plate can be reduced.

Description

Technical field [0001] The embodiment of the present invention relates to the technical field of lithography equipment, and in particular to a mask temperature control device and a mask exposure device. Background technique [0002] With the development of semiconductor technology and the development of high-tech equipment in the direction of compactness, exquisiteness and complexity, higher requirements have been placed on the line width of integrated circuits. Therefore, lithography machines are required to require higher overlay resolution. The over-engraving resolution of the lithography machine is affected by factors such as mechanical, optical, temperature and cleanliness. Small changes in the above factors may affect the over-engraving resolution of the lithography machine. [0003] In the overall structure of the lithography machine, the mask transmission module is the only module inside the lithography machine that realizes the transfer of the mask plate from the mask stor...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/70875G03F7/70741
Inventor 张明辉周剑锋郑锋标张帅
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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