Technology for PVD plating of transparent insulating film on surface of metal part
A technology of transparent insulation and transparent insulation layer, applied in metal material coating process, sputtering plating, ion implantation plating, etc., can solve the problems of single color, easy corrosion of metal parts, and inability to achieve surface insulation of metal parts. , to achieve the effect of simple process flow and low cost
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Embodiment 1
[0022] A process for PVD coating a transparent insulating film on the surface of a metal piece, comprising the following steps,
[0023] Step S01. Ultrasonic cleaning the metal part 1 coated with the color layer, putting it into a vacuum furnace, and vacuuming it to 2.0*10 -3 Pa, dry at 200°C for 60 minutes;
[0024] Step S02, feed argon gas into the above-mentioned vacuum furnace, control its feed flow rate to 500 sccm, workpiece bias voltage to 500 V, duty cycle to 30%, target current to 0.2 A, and ion-clean the metal parts for 60 min;
[0025] Step S03, turn off the argon gas and workpiece bias, and evacuate the vacuum furnace to a vacuum degree of (1.0-6.0)*10 -3 Pa, subsequently, pass argon gas into the vacuum chamber with the flow rate of 500sccm, make its internal vacuum degree maintain at 10 -1 Pa order of dynamic equilibrium pressure;
[0026] Step S04, using the vacuum planar magnetron sputtering method to sequentially coat the metal parts with a Si / Al transition ...
Embodiment 2
[0030] A process for PVD coating a transparent insulating film on the surface of a metal piece, comprising the following steps,
[0031] Step S01, after cleaning the metal piece 1 coated with the color layer, put it into a vacuum furnace, and evacuate it to 2.0*10 -3 Pa, dry at 200°C for 60 minutes;
[0032] Step S02, feed argon gas into the above-mentioned vacuum furnace, control its feed flow rate to 400 sccm, workpiece bias voltage to 350 V, duty cycle to 50%, target current to 0.3 A, and ion-clean the metal parts for 120 min;
[0033] Step S03, turn off the argon gas and workpiece bias, and evacuate the vacuum furnace to a vacuum degree of (1.0-6.0)*10 -3 Pa, subsequently, pass argon gas into the vacuum chamber with the flow rate of 400sccm, make its internal vacuum degree maintain at 10 -1 Pa order of dynamic equilibrium pressure;
[0034] Step S04, using the vacuum planar magnetron sputtering method to sequentially coat the metal parts with a Si / Al transition layer 2 ...
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