Unlock instant, AI-driven research and patent intelligence for your innovation.

A foundation pit drainage device

A technology for drainage devices and foundation pits, which is applied in infrastructure engineering, construction, etc., can solve problems such as open ditch occupation, water seepage, and impact on construction quality, and achieve the effects of reducing repeated pouring, improving quality, and saving pouring materials

Active Publication Date: 2021-12-10
温州京久基础工程有限公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In related technologies, open ditches are excavated in the foundation pit for drainage, but the open ditch occupies the construction surface. For subsequent construction, the open ditch will be buried when the cushion is poured, causing the groundwater head at the bottom of the cushion to rise, and water seeps from the bottom of the cushion. , Defects affecting subsequent construction quality

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A foundation pit drainage device
  • A foundation pit drainage device
  • A foundation pit drainage device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0036] The following is attached Figure 1-6 The application is described in further detail.

[0037] The embodiment of the present application discloses a drainage device for a foundation pit 1 . refer to figure 1 , 2 , The foundation pit 1 drainage device includes blind ditch 2, colored cloth strips, cushion 4, water collecting pipe 6, water pump 7 and water suction pipe 8.

[0038] refer to figure 2 , 3 , the blind ditch 2 is set at the bottom of the foundation pit 1, and the blind ditch 2 is dug along the edge of the bottom of the foundation pit 1. The blind ditch 2 is arranged in a closed loop, and cobblestones are also laid in the blind ditch 2 to filter the groundwater. The bottom of the blind ditch 2 is reinforced; the bottom of the foundation pit 1 is laid with colored cloth strips, the colored cloth strips are covered on the upper side of the foundation pit 1, and a cushion 4 is poured on the upper side of the colored cloth strips, and the cushion 4 is made of ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The application relates to a foundation pit drainage device, which relates to the field of building construction, which includes a blind ditch arranged on the inner wall around the foundation pit, a colored strip cloth laid on the upper side of the blind ditch, and a cushion layer poured on the upper side of the colored strip cloth , the water collection well which is located at the bottom of the foundation pit and communicates with the blind ditch, one end is inserted on the side wall of the foundation pit, and the other end passes through the cushion layer and the color strip cloth to extend to the water collection pipe in the blind ditch, and is arranged outside the foundation pit A water pump and a suction pipe with one end connected to the water pump and the other end connected to the sump well, the blind ditch is arranged at the bottom of the foundation pit. The application has the effects of preventing water from seeping out from the bottom of the cushion layer, reducing the influence of groundwater on the pouring structure, improving the quality of subsequent pouring construction, reducing repeated pouring, saving pouring materials, and being more energy-saving and environmentally friendly.

Description

technical field [0001] The present application relates to the field of building construction, in particular to a foundation pit drainage device. Background technique [0002] In order to ensure the safety and stability of the underground space formed by the excavation of the ground during the construction of the underground structure, the retaining structure, groundwater control, environmental protection and other measures are called foundation pit engineering. Foundation pit engineering is a system engineering integrating geological engineering, geotechnical engineering, structural engineering and geotechnical testing technology. Its main contents are: engineering survey, support structure design and construction, earthwork excavation and backfilling, groundwater control, informatization Construction and surrounding environmental protection, etc. [0003] In related technologies, open ditches are excavated in the foundation pit for drainage, but the open ditch occupies the...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): E02D19/06
CPCE02D19/06
Inventor 王光华王光环刘作麒
Owner 温州京久基础工程有限公司
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com