Alkali-soluble, photocurable, and thermosetting copolymer, and photosensitive resin composition, photosensitive resin film, and color filter using same

An alkali-soluble, heat-curing technology, which is used in photosensitive materials, instruments, optics, etc. for optomechanical equipment, can solve problems such as deformation, incomplete curing of photosensitive resin compositions, and reduced chemical resistance and heat resistance.

Active Publication Date: 2020-12-11
LG CHEM LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Generally used glass does not cause substantially deformation at this temperature, but plastics used for flexible displays have the problem of undergoing severe deformation at temperatures of 220°C or higher
[0006] In order to reduce the deformation of the substrate, a method of lowering the temperature of the post-baking process is used, but when the temperature of the post-baking process is lowered in this way, curing of the photosensitive resin composition does not occur completely, and thus is limited because not only The amount of gas increases and afterimages appear, and the chemical resistance and heat resistance also decrease

Method used

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  • Alkali-soluble, photocurable, and thermosetting copolymer, and photosensitive resin composition, photosensitive resin film, and color filter using same
  • Alkali-soluble, photocurable, and thermosetting copolymer, and photosensitive resin composition, photosensitive resin film, and color filter using same
  • Alkali-soluble, photocurable, and thermosetting copolymer, and photosensitive resin composition, photosensitive resin film, and color filter using same

Examples

Experimental program
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Synthetic example

[0226]

Synthetic example 1

[0228] Together with 75.0% by weight of propylene glycol methyl ether acetate (PGMEA) as solvent, 4.8% by weight of benzyl methacrylate, 0.8% by weight of N-phenylmaleimide, 0.6% by weight % of styrene and 12.3% by weight of glycidyl methacrylate were dissolved and then the temperature was raised to 75° C. under a nitrogen atmosphere. When the reaction temperature reached 75°C, 1.2% by weight of thermal initiator V-65 was added, followed by reaction for 12 hours.

[0229] After adding a thermal polymerization inhibitor and a catalyst to the resin solution thus obtained, 2.2% by weight of methacrylic acid was added under an air atmosphere, and reacted while maintaining 120° C. for 16 hours.

[0230] Subsequently, the temperature of the resin solution was lowered to 80°C, 2.0% by weight of succinic anhydride was added thereto, and the mixture was further stirred at 80°C for 24 hours to prepare an alkali-soluble, photocurable and thermally curable copolymer ( Mw: 6260 g / mol, Av:...

Synthetic example 2

[0239] An alkali-soluble, photocurable, and heat-curable copolymer was synthesized in the same manner as in Synthesis Example 1, except that 3,4-epoxycyclohexylmethyl methacrylate was used instead of glycidyl methacrylate.

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Abstract

The present invention pertains to: a copolymer which has all of alkali solubility, photocurability and thermosetting ability and contains three types of (meth)acrylate repeating units classified according to the types of functional groups present at the terminals; and a photosensitive resin composition, a photosensitive resin film, and a color filter using the copolymer.

Description

technical field [0001] Cross References to Related Applications [0002] This application claims the benefit of Korean Patent Application No. 10-2019-0035267 filed with the Korean Intellectual Property Office on March 27, 2019, the disclosure of which is incorporated herein by reference in its entirety. [0003] The present invention relates to an alkali-soluble, photocurable and thermally curable copolymer, and a photosensitive resin composition, a photosensitive resin film, and a color filter using the same. More particularly, the present invention relates to a copolymer having excellent thermal curability at a relatively low temperature, and photosensitive resin composition, photosensitive resin film and color filter using the same, which can be photosensitive under light irradiation. Cured, there may be an enhanced degree of cure and thus superior durability and chemical resistance, as well as increased alkali solubility and thus improved development characteristics. B...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F220/26C08F220/32C08F220/18C08F222/40C08F265/06C08F2/50G03F7/004G03F7/027G03F7/028G03F7/00
CPCC08F2/50G03F7/00G03F7/0388G03F7/038G03F7/033G03F7/40C08J3/24C08J2333/14C08F220/1807C09D4/06C08F265/06C08F220/325C08F222/40C08F212/08C08F222/1006C08F220/26C08F220/32C08F220/18G03F7/004G03F7/027G03F7/028G03F7/0007
Inventor 朴惠真赵昌镐
Owner LG CHEM LTD
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