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3results about How to "Improve edge roughness" patented technology

Positive resist materials and pattern formation methods

This invention relates to positive resist materials and a method for forming patterns. The objective of this invention is to provide a positive resist material and a method for forming patterns that exhibit controlled acid diffusion, superior resolution compared to known positive resist materials, smaller edge roughness and dimensional deviations, and better pattern shape after exposure. The solution to this objective is a positive resist material comprising a base polymer capped with a sulfonate salt containing a carboxylic acid anion attached to a thioether group.
Owner:SHIN ETSU CHEMICAL CO LTD

A method and apparatus for repairing broken microcircuits in micro-nano 3D printed micro-nano circuits based on electric field-driven micro / nano 3D printing.

This invention belongs to the field of precision electronic circuit manufacturing technology, and provides a method and device for repairing broken lines in micro-circuits based on electric field-driven micro / nano 3D printing. This invention employs electric field-driven jet deposition micro / nano 3D printing technology, with the printing nozzle connected to a high-voltage power supply. Utilizing the diameter reduction effect of the Taylor cone in electrostatic dynamics, it achieves the fabrication of micro / nano-scale feature structures. Under the action of electrostatic field tension (changing traditional pressure-driven to tension-driven), high-viscosity materials can be printed with high resolution, enabling the repair of conductive line defects below 1μm. It is particularly suitable for repairing three-dimensional / curved conductive lines and conductive line defects in large-size (meter-scale) substrates. This invention can achieve high-resolution, high-precision, low-cost, and efficient repair of micro-precision conductive line defects.
Owner:QINGDAO 5D INTELLIGENT ADDITIVE MFG TECH CO LTD

Sulfonium sulfonate photoacid generator and photoresist composition thereof

The invention provides a sulfonium sulfonate photoacid generator and a photoresist composition thereof. The photoacid generator provided by the invention has relatively large molecular weight, can reduce diffusion of a conventional photoacid generator in a use process, and is beneficial to improving a process window and edge roughness of photoresist.
Owner:GUOKE TIANJI (SHANDONG) NEW MATERIAL CO LTD