Sulfonium sulfonate salt photoacid generator synthesized from guaiacol and synthesis method for sulfonium sulfonate salt photoacid generator

A technology of photoacid generator and guaiac alcohol, which is applied in the preparation of sulfonate, photosensitive materials used in photomechanical equipment, organic chemistry, etc., can solve the problems of inability to reduce edge roughness, etc., and achieve easy preparation, generation, Effect of reducing line width roughness and increasing fat solubility

Pending Publication Date: 2020-05-12
上海博栋化学科技有限公司
View PDF8 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing photoacid generators still have the problem of acid diffusion, which makes it impossible to reduce the edge roughness

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sulfonium sulfonate salt photoacid generator synthesized from guaiacol and synthesis method for sulfonium sulfonate salt photoacid generator
  • Sulfonium sulfonate salt photoacid generator synthesized from guaiacol and synthesis method for sulfonium sulfonate salt photoacid generator
  • Sulfonium sulfonate salt photoacid generator synthesized from guaiacol and synthesis method for sulfonium sulfonate salt photoacid generator

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] This embodiment provides a kind of sulfonate salt photoacid generator synthesized by guaiacol, the reaction scheme of the synthetic method of this photoacid generator is as follows:

[0041]

[0042] It specifically includes the following steps:

[0043] S1. Sodium hydroxide (7g, 175mmol) was dissolved in water (17g) to form a 30% sodium hydroxide solution; methyl fluorosulfonyl difluoroacetate 1-1 (10g, 52mmol) was added to ice water ( 33g) to obtain the reaction solution, and slowly add 30% sodium hydroxide solution prepared under stirring into the above-mentioned reaction solution, after the addition, the reaction solution was stirred in an ice bath (control temperature is lower than 10 degrees Celsius) 2.5 hours, then continue to stir at room temperature for 1 hour, start heating, make the temperature rise to 95 degrees Celsius within 30 minutes, and stir at 95 degrees Celsius for 3 hours, stop heating, cool to room temperature, neutralize with hydrochloric acid,...

Embodiment 2

[0048] This embodiment provides a kind of sulfonate salt photoacid generator synthesized by guaiacol, the reaction scheme of the synthetic method of this photoacid generator is as follows:

[0049]

[0050] It specifically includes the following steps:

[0051] S1. Under the protection of nitrogen at 0°C, add pyridine (9g, 114mmol), bis(trichloromethyl)carbonate (4.5g, 15mmol) into dichloromethane (300g), and slowly add heal Chuang wood alcohol 2-1 (10g, 45mmol) to obtain the reaction solution; then, the reaction solution was stirred at room temperature for 3 hours, and then 1,1-difluoro-2-hydroxyl-ethanesulfonic acid sodium salt (8.8g , 48mmol) was added in the reaction solution, stirred for 10 hours, the reaction solution was concentrated under vacuum to obtain a mixture, the mixture was filtered to obtain a solid, and the solid was washed three times with acetonitrile (150g×3), the acetonitrile solution was collected, and the acetonitrile solution collected was concentra...

Embodiment 3

[0054] This embodiment provides a kind of sulfonate salt photoacid generator synthesized by guaiacol, the reaction scheme of the synthetic method of this photoacid generator is as follows:

[0055]

[0056] It specifically includes the following steps:

[0057] S1. Under nitrogen at 0°C, sodium hydride (1.3g, 54mmol) was slowly added to a mixture of guaiacol 3-1 (10g, 45mmol) and anhydrous tetrahydrofuran (200g), and stirred for 20 minutes; Next, ethyl bromoacetate (8 g, 48 mmol) was added dropwise to the above mixture, and stirred for 20 minutes; then, stirred at 25° C. for 6 hours for reaction, and quenched by adding water at 0° C. after the reaction was completed. Concentrate the quenched mixture by rotary evaporation, extract three times with dichloromethane (150g×3), combine the extracts, wash and separate the liquids with saturated brine (100g), dry over anhydrous sodium sulfate, and concentrate by rotary evaporation to obtain Crude product; the crude product was pur...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a sulfonium sulfonate salt photoacid generator synthesized from guaiacol and a synthesis method for the sulfonium sulfonate salt photoacid generator, belonging to the fields ofchemical synthesis and photoetching materials. The photoacid generator has a structural general formula which is described in the specification. In the structural general formula, R1 is one selectedfrom the group consisting of groups which are described in the specification; and R2 is one selected from the group consisting of a covalent bond, an alkyl group, a cycloalkyl group, an ester group containing alkyl group and a fluorine-containing alkyl group. The synthesis method for the photoacid generator comprises the following steps: allowing the guaiacol to react with a sulfonate compound soas to obtain an intermediate; and allowing the intermediate to react with (cyclohexyl-1,5-dienyloxy)-trimethyl-silane, tetramethylene sulfoxide and trifluoroacetic anhydride so as to obtain the sulfonium sulfonate salt photoacid generator is obtained. According to the invention, a raw material, namely the guaiacol adopted in the method provided by the invention has large molecular weight, so the photoacid generator formed by the guaiacol also has large molecular weight; diffusion of the photoacid generator can be reduced; and improvement of the edge roughness, reduction of the line width roughness and improvement of the resolution ratio are facilitated.

Description

technical field [0001] The invention relates to the fields of chemical synthesis and photolithographic materials, in particular to a sulfonate sulfonium salt photoacid generator synthesized from guaiac alcohol and a synthesis method thereof. Background technique [0002] Photolithography technology refers to the chemical sensitivity of photoresist materials (especially photoresist) under the action of visible light, ultraviolet rays, electron beams, etc., through exposure, development, etching and other processes, the design on the mask plate Graphics microfabrication technology that transfers graphics to the substrate. [0003] The development of lithography technology is inseparable from the development of lithography materials, and the development of lithography materials determines the development and application of lithography technology to a certain extent. Photolithography materials (especially photoresist), also known as photoresist, are the most critical functional...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C07D333/10C07C303/32C07C309/12C07C309/17G03F7/004
CPCC07C303/32C07C309/12C07C309/17C07C2602/30C07D333/10G03F7/004
Inventor 毕景峰李嫚嫚喻珍林蒋小惠贺宝元
Owner 上海博栋化学科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap