Sulfonium sulfonate salt photoacid generator synthesized from cedrol and synthesis method for sulfonium sulfonate salt photoacid generator

The technology of a photoacid generator and a synthesis method is applied in the preparation of sulfonates, photosensitive materials for optomechanical equipment, organic chemistry, etc., which can solve the problems such as the inability to reduce edge roughness, and achieve easy preparation and generation, good transparency. , Improve the effect of edge roughness

Pending Publication Date: 2020-05-12
上海博栋化学科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing photoacid generators still have the problem of

Method used

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  • Sulfonium sulfonate salt photoacid generator synthesized from cedrol and synthesis method for sulfonium sulfonate salt photoacid generator
  • Sulfonium sulfonate salt photoacid generator synthesized from cedrol and synthesis method for sulfonium sulfonate salt photoacid generator
  • Sulfonium sulfonate salt photoacid generator synthesized from cedrol and synthesis method for sulfonium sulfonate salt photoacid generator

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0039] Example 1

[0040] This embodiment provides a sulfonium sulfonium salt photoacid generator synthesized from cedarwood alcohol. The reaction route of the synthesis method of the photoacid generator is as follows:

[0041]

[0042] It specifically includes the following steps:

[0043] S1. Dissolve sodium hydroxide (7g, 175mmol) in water (18g) to prepare a solution; add methyl fluorosulfonyl difluoroacetate (10g, 52mmol) to ice water (25g) to obtain a reaction solution, and Under stirring, the prepared sodium hydroxide solution was slowly added to the above reaction solution. After the addition, the reaction solution was stirred for 2.5 hours in an ice bath (controlling the temperature below 10 degrees Celsius), and then continued stirring at room temperature for 1 hour. , Start heating, raise the temperature to 95 degrees Celsius within 30 minutes, and stir at 95 degrees Celsius for 3 hours, stop heating, cool to room temperature, neutralize with hydrochloric acid, filter the ...

Example Embodiment

[0047] Example 2

[0048] This embodiment provides a sulfonium sulfonium salt photoacid generator synthesized from cedarwood alcohol. The reaction route of the synthesis method of the photoacid generator is as follows:

[0049]

[0050] It specifically includes the following steps:

[0051] S1. Under the protection of nitrogen at 0℃, add pyridine (9.5g, 120mmol) and bis(trichloromethyl) carbonate (5.0g, 17mmol) to dichloromethane (300g), and slowly add under stirring Cedarwood 2-1 (10.0g, 45mmol) to obtain a reaction solution; then, the reaction solution was stirred at room temperature for 3 hours, and then 1,1-difluoro-2-hydroxy-ethanesulfonic acid sodium salt (8.8g , 48mmol) was added to the reaction solution and stirred for 10 hours. The reaction solution was concentrated under vacuum to obtain a mixture, and n-heptane (120g) was added to obtain a solid by filtration. The solid was added to acetonitrile (120g), stirred and dissolved, and the filtrate was collected by filtration. ...

Example Embodiment

[0053] Example 3

[0054] This embodiment provides a sulfonium sulfonium salt photoacid generator synthesized from cedarwood alcohol. The reaction route of the synthesis method of the photoacid generator is as follows:

[0055]

[0056] It specifically includes the following steps:

[0057] S1. Under nitrogen at 0°C, sodium hydride (1.2g, 50mmol) was slowly added to the mixture of cedar alcohol 3-1 (10g, 45mmol) and anhydrous tetrahydrofuran (200g), and stirred for 20 minutes; then, Ethyl bromoacetate (8g, 48mmol) was added dropwise to the above mixture and stirred for 20 minutes; then, stirred at 25°C for 6 hours for reaction. After the reaction was completed, it was quenched by adding water at 0°C. The quenched mixture was concentrated by rotary evaporation, extracted three times with dichloromethane (50g×3), the organic phases were combined, washed with saturated brine (100g), dried over anhydrous sodium sulfate, and concentrated by rotary evaporation to obtain a crude product T...

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Abstract

The invention discloses a sulfonium sulfonate salt photoacid generator synthesized from cedrol and a synthesis method for the sulfonium sulfonate salt photoacid generator, belonging to the fields of chemical synthesis and photoetching materials. The photoacid generator has a structural general formula which is described in the specification. In the structural general formula, R1 is one selected from the group consisting of groups which are described in the specification; and R2 is one selected from the group consisting of a covalent bond, an alkyl group, a cycloalkyl group, an ester group-containing alkyl group and a fluorine-containing alkyl group. The synthesis method for the photoacid generator comprises the following steps: allowing the cedrol to react with a sulfonate compound so as to obtain an intermediate; and allowing the intermediate to react with (cyclohexyl-1,5-dienyloxy)-trimethyl-silane, tetramethylene sulfoxide and trifluoroacetic anhydride so as to obtain the sulfoniumsulfonate salt photoacid generator. According to the invention, a raw material, namely the cedrol has large molecular weight, so the photoacid generator formed by the cedrol also has large molecular weight; diffusion of the photoacid generator can be reduced; and improvement of the edge roughness, reduction of the line width roughness and improvement of the resolution ratio are facilitated.

Description

technical field [0001] The invention relates to the fields of chemical synthesis and photolithography materials, in particular to a sulfonium sulfonium salt photoacid generator synthesized from cedaryl alcohol and a synthesis method thereof. Background technique [0002] Photolithography technology refers to the chemical sensitivity of photoresist materials (especially photoresist) under the action of visible light, ultraviolet rays, electron beams, etc., through exposure, development, etching and other processes, the design on the mask plate Graphics microfabrication technology that transfers graphics to the substrate. [0003] The development of lithography technology is inseparable from the development of lithography materials, and the development of lithography materials determines the development and application of lithography technology to a certain extent. Photolithographic materials (especially photoresist), also known as photoresist, are the most critical functiona...

Claims

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Application Information

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IPC IPC(8): C07D333/46C07C303/32C07C309/17C07C309/12G03F7/004
CPCC07C303/32C07C309/12C07C309/17C07C2603/78C07D333/46G03F7/004
Inventor 郭颖潘惠英喻珍林李嫚嫚王尹卓
Owner 上海博栋化学科技有限公司
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