Copolymer having photocurable and thermosetting property, and photosensitive resin composition, photosensitive resin film, and color filter using same

A technology of thermal curing and light curing, which is applied in the direction of electric solid devices, semiconductor devices, electrical components, etc., and can solve the problems of gas increase, afterimages, and photosensitive resin compositions that cannot be completely cured.

Active Publication Date: 2020-01-17
LG CHEM LTD
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] After development, a post-baking process applying heat of 220°C or higher is finally performed, and while glass generally used does not deform at this temperature, plastics used in flexible displays are severely deformed at temperatures above 220°C
[0006] In order to reduce such deformation of the substrate, a method of lowering the temperature of the post-baking process is used, but when the temperature of the post-baking process is lowered, the photosensitive resin composition may not be fully cured, and thus the amount of gas generated may increase, possibly Afterimages occur, and chemical resistance and heat resistance may deteriorate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Copolymer having photocurable and thermosetting property, and photosensitive resin composition, photosensitive resin film, and color filter using same
  • Copolymer having photocurable and thermosetting property, and photosensitive resin composition, photosensitive resin film, and color filter using same
  • Copolymer having photocurable and thermosetting property, and photosensitive resin composition, photosensitive resin film, and color filter using same

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example

[0162]

Synthetic example 1

[0164] 5.1% by weight of benzyl methacrylate, 0.8% by weight of N-phenylmaleimide, 0.6% by weight of styrene and 13.2% by weight of glycidyl methacrylate and 78.9% by weight of % propylene glycol methyl ether acetate (PGMEA) solvent to dissolve them, and then the temperature of the solution was raised to 75° C. under nitrogen atmosphere. When the temperature of the reactants reached 75°C, 1.2% by weight of thermal initiator V-65 was added, and then the reactants were allowed to react for 12 hours. To the obtained resin solution, a thermal polymerization inhibitor and a catalyst were added, and then 0.1% by weight of methacrylic acid was introduced under an air atmosphere, and the reactants were reacted for 16 hours while keeping the temperature at 120°C. The weight-average molecular weight of the prepared photocurable and thermally curable copolymer is 4500g / mol, and the content of (meth)acrylate repeating units substituted with epoxy groups at the end of the branched chain is...

Synthetic example 2

[0166] A photocurable and thermally curable copolymer was synthesized by the same method as in Synthesis Example 1, except that 3,4-epoxycyclohexylmethyl methacrylate was used instead of glycidyl methacrylate. The weight-average molecular weight of the prepared photocurable and thermally curable copolymer is 4700g / mol, and the content of (meth)acrylate repeating units substituted with epoxy groups at the end of the branched chain is 49mol%. The content of the (meth)acrylate repeating unit substituted with an alkenyl group at the terminal was 21 mol%.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention relates to a copolymer having photocurable and thermosetting properties, which shows excellent thermosetting at relatively low temperatures and can also undergo a photocuring process upon light exposure, thus ensuring excellent durability, chemical resistance, and storage stability through the sufficient hardening, and a photosensitive resin composition, a photosensitive resin film, and a color filter using the same.

Description

technical field [0001] Cross References to Related Applications [0002] This application claims Korean Patent Application No. 10-2017-0149676 filed with the Korean Intellectual Property Office on November 10, 2017 and Korean Patent Application No. 10-2018-0136598 filed with the Korean Intellectual Property Office on November 8, 2018 rights and interests, their disclosures are incorporated herein by reference in their entirety. [0003] The present invention relates to a photocurable and thermally curable copolymer, a photosensitive resin composition using the same, a photosensitive resin film, and a color filter. More specifically, the present invention relates to a photocurable and heat curable copolymer having excellent heat curability even at a relatively low temperature, and a photosensitive resin composition, a photosensitive resin film, and a color filter using the same. properties, can be photocured by light irradiation, and has excellent durability, chemical resist...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C08F220/32C08F220/18C08F220/56C08J5/18C08F2/50H01L27/32
CPCC08F220/32C08F220/18C08F220/56C08J5/18C08F2/50C08F220/20C08F220/325
Inventor 朴惠真赵昌镐安贞爱吴美莲孙敬喆
Owner LG CHEM LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap