Polishing pad trimmer, polishing equipment and method

A polishing pad and dresser technology, which is applied in the direction of grinding/polishing equipment, metal processing equipment, abrasive surface adjustment devices, etc., can solve the problem that brush type and diamond type dresser can be used at the same time or alternately, and can not achieve cleaning And other problems, to achieve the effect of improving the polishing effect, good cleanliness, and improving polishing efficiency
CN112077743AInactive Publication Date: 2020-12-15ZING SEMICON CORP
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
ZING SEMICON CORP
Publication Date
2020-12-15
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention provides a polishing pad trimmer, polishing equipment and a method. The polishing pad trimmer comprises a driving device, a mounting base plate, a diamond trimming head, a brush, an elastic connecting piece and a controller, wherein the mounting base plate comprises a first surface, the diamond trimming head is arranged on the first surface of the mounting base plate, and the brush is arranged on the first surface of the mounting base plate through the elastic connecting piece; and the driving device is connected with the mounting base plate and the controller and is used for applying pressure to the mounting base plate under the control of the controller, and the expansion degree of the elastic connecting piece is changed along with the change of the pressure, so that the height of the brush relative to the diamond trimming head is changed, and different trimming purposes are achieved. By the adoption of the polishing pad trimmer, in the polishing operation process, thediamond trimming head or the brush can be flexibly switched as required, the polishing effect is improved, and the polishing efficiency is improved.
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Description

technical field

[0001] The invention relates to the field of silicon wafer preparation, in particular to a polishing pad dresser, polishing equipment and a method. Background technique

[0002] Pad conditioner / Dresser is a device used to improve the surface condition of polishing pads in the silicon wafer polishing process. At present, there are mainly two types of polishing pad conditioners: brush type and diamond type. The brush type mainly plays the role of cleaning the polishing pad. It has less wear and consumption of the polishing pad, and has less influence on the uniformity of the polishing process. It is mainly used for soft polishing pads; the diamond type mainly plays the role of improving the roughness of the polishing pad. It also has a certain cleaning effect. It has a relatively large wear and tear on the polishing pad, and has a relatively large impact on the uniformity of the polishing process. It is mainly used for hard polishing pads.

[0003] However, t...

Claims

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