Laser direct light control device for coating machine

Abstract

The invention discloses a laser direct light control device for a coating machine. The laser direct light control device for the coating machine comprises a light source, a signal receiver and a toolpart, wherein at least two film forming bases are arranged on the tool part; the two film forming bases are arranged on the circumference with the center of the tool part as the circle center; at least one film forming base is a monitoring base; and at least one monitoring substrate is arranged on the monitoring base. The laser direct light control device for the coating machine further comprisesa shielding component, wherein the shielding component is arranged on the side, close to an evaporation source, of the monitoring base; a through hole is formed in the shielding component in the thickness direction; and and the shielding component is in running fit with the monitoring base, so that all the monitoring substrates can be exposed through the through holes, and only one of the monitoring substrates is exposed through the corresponding through hole each time. According to the laser direct light control device for the coating machine provided by the invention, the accumulated tolerance of film thickness measurement is reduced, and the measurement accuracy is improved.

Description

technical field [0001] The invention relates to the technical field of evaporation coating, in particular to a laser direct light control device for a coating machine. Background technique [0002] Evaporation coating is often called vacuum coating. It is characterized in that under vacuum conditions, the material evaporates and condenses on the glass surface to form a film with strong adhesion. The spectral characteristics of the film are determined by the thickness and refractive index of the film. In actual production, in order to ensure the spectral characteristics of the film, it is necessary to accurately monitor the thickness of each layer of film on-line during the coating process. At present, there are mainly two methods for online monitoring of film thickness: crystal oscillation and optical control. The crystal oscillation method belongs to the indirect measurement method; the optical control method belongs to the direct measurement method, which has higher measur...

AI Technical Summary

Problems solved by technology

The film thickness detection in the prior art includes collecting the light transmittance of the light signal through the film by the signal receiver, and calculating the optical thickness of the film through the light transmittance. In this way, the intensity of the light signal collected by the signal receiver will be It weakens as the film thickness increases, resulting in a decrease in monitoring accuracy, and will cause measurement errors to accumulate as the number of film layers increases

Images