Photoetching machine performance evaluation system based on key index algorithm and application method thereof

Abstract

The invention provides a photoetching machine performance evaluation system based on a key index algorithm and an application method thereof, and the method comprises the steps: providing production source data of a photoetching machine, and processing production source data through a data processing module to obtain initial version data; obtaining a plurality of key indexes based on the initial version data; carrying out system development based on a plurality of key indexes, including interface design and logic implementation thereof; designing an interface project; creating a service program and implementing the service program; creating a host and creating an agent; and sequencing the efficiency among photoetching machines. A key index algorithm is designed to better evaluate the utilization efficiency of the photoetching machine, systematize the algorithm design, predict the incoming condition or the state of the machine based on historical and current data, and monitor the current running condition of the machine in real time, thereby being beneficial to solving the machine with the optimal efficiency and obtaining the efficiency utilization sequence among the machines. Efficiency evaluation of the photoetching machine is accurate.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a lithography machine efficiency evaluation system based on a key index algorithm and an application method thereof. Background technique [0002] First of all, for the evaluation of the utilization rate of lithography machines, the usual practice is that technicians check the no-load status of each machine on the static report based on the established historical data. This method can only stay in a rough evaluation. In fact, the actual time of LOT entering and exiting the machine, the number of slides per LOT, the number of switching times of the photolithography plate, and the downtime are all factors that affect the evaluation of the operating efficiency of the machine; at the same time, the existing methods lack real-time information on such data. monitor. For the technology-intensive semiconductor manufacturing industry, the performance evaluation of lithography mach...

AI Technical Summary

Problems solved by technology

[0004] In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide a lithography machine performance evaluation system based on key index algorithms and its application method, which is used to solve the evaluation method of lithography machine utilization in the prior art There is a lack of real-time monitoring of such data, and the performance evaluation of lithography machines cannot be accurate

Images