Semiconductor substrate photoresist layer defect detection system based on AI and cloud computing technologies

Abstract

The invention discloses a semiconductor substrate photoresist layer defect detection system based on AI and cloud computing technologies, and the invention is characterized in that a controller controls a to-be-detected product to reach a state code obtaining station, and a product information obtaining module obtains the product state code of the to-be-detected product; the matching module judgeswhether the product has a corresponding detection model or not based on the product state code, if yes, the controller controls the to-be-detected product to reach an image acquisition station, and the image acquisition device acquires a to-be-detected image; the detection module calls a corresponding detection model to detect the to-be-detected image, and if the detection is qualified, the to-be-detected product is marked as qualified or unqualified; and the controller controls the to-be-detected product to move to a subsequent station, and the database stores detection records. The AI and cloud computing technology is adopted, the defects of the photoresist layer can be automatically detected, the problems that manual detection of the defects on the surface of the photoresist layer of the substrate is low in efficiency, poor in accuracy, poor in timeliness and the like are solved, and the purposes of replacing manual rapid detection, improving efficiency, reducing cost, improving accuracy and the like are achieved.

Description

technical field [0001] The invention relates to the field of semiconductor technology, in particular to a semiconductor substrate photoresist layer defect detection system based on AI and cloud computing technology. Background technique [0002] Photoresists are organic compounds that change in solubility in developing solutions when exposed to ultraviolet light. The photoresist used in the manufacture of silicon wafers is applied to the surface of silicon wafers in liquid form and then dried to form a film. Photoresist is one of the key materials for micro-pattern processing in microelectronics technology, especially the development of large-scale and ultra-large-scale integrated circuits in recent years, which has greatly promoted the research, development and application of photoresist. [0003] In the pan-semiconductor field, the quality of the photoresist layer of the substrate directly affects the quality of the final product, so the defect detection of the photoresis...

AI Technical Summary

Problems solved by technology

Existing substrate photoresist layer defect detection usually adopts manual detection method, which has low sampling rate, low accuracy, poor real-time performance, low efficiency, high labor intensity, and is greatly affected by manual experience and subjective factors problem, the detection effect is poor

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