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Interferometer with pixelated phase shift mask

A technology of phase shifting interference and interferometer, which is applied in the field of interferometry and can solve problems such as interfering with the performance of equipment

Pending Publication Date: 2021-05-04
昂图创新有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Defects, such as particles or other irregularities on the sample, can interfere with the performance of the resulting device

Method used

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  • Interferometer with pixelated phase shift mask
  • Interferometer with pixelated phase shift mask
  • Interferometer with pixelated phase shift mask

Examples

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Embodiment Construction

[0020] figure 1 A schematic diagram of an optical metrology apparatus 100 is shown that includes a phase mask to perform interferometric detection of sample surface topography from a single camera image. Optical metrology device 100 is shown as a phase-shifting interferometer, and may sometimes be referred to herein as interferometer 100 . By using a phase mask, data can be acquired with a single exposure, and thus the time for each acquisition is controlled by the time for moving, focusing and performing pattern recognition, and the image transfer rate. Additionally, by acquiring data with a single exposure, the effects of vibrations in all axes are reduced, especially those at low frequencies. Interferometer 100 may use surface measurements to evaluate a sample, for example, to determine one or more properties of the sample or features on the sample or to find defects located on the sample.

[0021] Phase masks conventionally use arrays of repeating 2x2 pixel blocks with d...

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Abstract

An interferometer uses a phase shift mask that includes an array of pixels that are aligned with a corresponding array of pixels of a detector. Each pixel in the phase shift mask is adapted to produce one of a number of predetermined phase shifts between a test beam and a reference beam. For example, the pixels may be linear polarizers or phase delay elements having one of the number of polarizer orientations or phase delays to produce the predetermined phase shifts between the test beam and the reference beam. The pixels in the phase shift mask are arranged in the array to include each of the predetermined phase shifts in repeating pixel groups in rows that are one column wide, columns that are one row high, or blocks of multiple rows and columns.

Description

[0001] Cross references to related patent applications [0002] Under 35USC 119, this application claims priority to the following application: U.S. Provisional PHASE MASK FOR WAFERDEFECT DETECTION, filed September 28, 2018, entitled "OPTIMIZED PIXELATED PHASE MASK FOR WAFERDEFECT DETECTION" Application No. 62 / 738,789, and U.S. Provisional Application No. 62 / 739,574, entitled "OPTIMIZED PIXELATED PHASE MASK FOR WAFERDEFECT DETECTION," filed October 1, 2018, and U.S. Nonprovisional Application No. 16 / 197,929, entitled "INTERFEROMETER WITH PIXELATED PHASE SHIFT MASK," filed November 21, 2018, all of which are incorporated by reference in their entirety. into this article. technical field [0003] The present invention relates to interferometry, and in particular, to interferometry using optical phase differences. Background technique [0004] Semiconductor and other similar industries commonly use optical metrology equipment to provide non-contact evaluation of substrates du...

Claims

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Application Information

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IPC IPC(8): G01B9/02G01B11/24G02B21/14G01N21/94G01N21/95G01N21/956G02B27/28G02B27/58H01L21/66
CPCG01B9/02041G01B9/02042G01B9/0207G01B9/02081G01B9/02083G01B9/02087G01B11/2441G01B2210/56G01N21/9501G01N21/956G01N2021/8848G02B21/14G02B27/286H01L22/20H01L22/12G01B11/303G01N21/8806G01B9/02011
Inventor N·P·史密斯
Owner 昂图创新有限公司
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