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Wavefront aberration measurement system, associated visual perception learning training system and method

A wavefront aberration and measurement system technology, applied in the field of aberration measurement system and ophthalmology optics, can solve the problem of low measurement accuracy of large refractive error, limited ability to measure low-order aberrations, and failure to measure high-order aberrations of the human eye. Aberration and other problems, to achieve high maintenance costs, improve instrument performance, and avoid measurement errors

Pending Publication Date: 2021-05-07
REYEMICO (ZHEJIANG) MEDICAL TECH LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Patent Publication No. WO2005048829A2 discloses a method for measuring binocular aberration using wavefront technology, but its measurement accuracy for large refractive errors is not high due to structural limitations
Specifically, there is no pre-compensation structure in the wavefront aberration measurement of this technology to pre-correct the low-order aberrations, so the low-order aberration measurement capability of the Hartmann wavefront aberration measurement system is limited, when the refractive error Higher-order aberration measurement accuracy is not high when the value is large
[0007] The patent with the publication number CN105496351A reports a binocular optometry device and optometry method. This method only measures defocus, astigmatism and astigmatism axial position, but fails to measure high-order aberrations of the human eye, and there is no three-dimensional binocular vision in the solution. Positioning device, and the accuracy of astigmatism measurement is not high

Method used

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  • Wavefront aberration measurement system, associated visual perception learning training system and method
  • Wavefront aberration measurement system, associated visual perception learning training system and method
  • Wavefront aberration measurement system, associated visual perception learning training system and method

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Embodiment 1

[0071] Embodiment 1 of the present invention provides a wavefront aberration measurement system 100 . The system is provided with a left eye and a right eye path. The operation of the system is described below.

[0072] Step 1 Three-dimensional positioning of binocular pupils

[0073] When working, first perform the three-dimensional positioning of the binocular pupils. For the convenience of description, the figure 1 The left-hand work shown is described. Use infrared light-emitting diode 2 to illuminate the pupil of the left eye 1 to be measured, the first pupil camera 3 and the second pupil camera 4, the first pupil camera 3 and the second pupil camera 4 form a pupil camera pair, and the pupil camera pair (3, 4) pairs It is fixed at a certain interval, and its axis keeps the same angle with the optical axis, that is, θ1=θ2.

[0074] image 3 A block diagram schematically shows the working relationship between the computer 17 and other devices. According to the imag...

Embodiment 2

[0083] The same or similar components use the same reference numerals as in Embodiment 1. Embodiment 2 of the present disclosure provides another wavefront aberration measurement system 200 . The system is provided with a left eye and a right eye path. Such as figure 2 shown.

[0084] Step 1 Three-dimensional positioning of binocular pupils

[0085] When the wavefront aberration measurement system 200 is started and started to work, the three-dimensional positioning of the binocular pupils is first performed. For the convenience of description, the figure 2 The left-hand work shown is described. Use the infrared light-emitting diode 2 to illuminate the pupil of the measured human eye 1 (left eye), the first pupil camera 3 and the second pupil camera 4 are fixed at a certain interval, and their axes keep the same angle with the optical axis, that is, θ1=θ2 . According to the images collected by the first pupil camera 3 and the second pupil camera 4, the computer 17 o...

Embodiment 3

[0092] The disclosure further provides application embodiments. As described above, the present disclosure provides a wavefront aberration measurement system. The wavefront aberration measurement system can provide more accurate wavefront aberration measurement. Since the system is a precision instrument, the cost is relatively high. In order to expand the application scene, the present invention further provides a new application mode.

[0093] Embodiment 3 provides a kind of visual perception learning training method, comprises the steps:

[0094] Step 1 Use the wavefront aberration measurement system of the present invention to obtain the wavefront aberration parameters of the subject;

[0095] Step 2 provides the subject with a separate visual function correction training device, which includes an aberration correction device and a visual function training device. Further, the visual function correction training device does not configure an aberration measurement system,...

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Abstract

The invention provides a wavefront aberration measurement system. The system comprising a left eye optical path and a right eye optical path, wherein the left eye optical path and the right eye optical path respectively comprises a pupil positioning subsystem comprising a pupil illumination device and a pupil imaging device, an aberration compensation subsystem comprising an internal focusing device and a rotary cylindrical mirror pair, a wavefront aberration measurement subsystem comprising a beacon light source, a light beam matching device, an aperture segmentation element and a photoelectric detector, and a display subsystem comprising a sighting mark imaging objective lens and a sighting mark display device, wherein the wavefront aberration measurement system further comprises a computer which is used for controlling combined work of the subsystems in wavefront aberration measurement and recording and analyzing measurement results. The system can complete binocular three-dimensional positioning, binocular image fusion and aberration compensation, then controls the measurement system to measure the wavefront aberration of the binocular at the same time, and ensures the wavefront aberration of human eyes, especially the accuracy and consistency of high-order aberration measurement.

Description

technical field [0001] The present disclosure relates to ophthalmology optics, in particular, the present disclosure relates to an aberration measurement system, and more particularly, relates to a wavefront aberration measurement system and a visual perception learning training system and a visual perception learning training method associated therewith . [0002] technical background [0003] More than 85% of the information that people get from the outside world comes from vision. Therefore, the eye is an important organ for human beings to communicate with the outside world. It is particularly important to detect and evaluate the health of the human eye's visual function. As a typical optical system, the human eye contains a variety of aberration components. In addition to defocus and astigmatism, it also includes more high-order aberrations, such as coma, trefoil aberration, and spherical aberration. Hartmann wavefront sensing technology is the most commonly used techno...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61B3/00A61B3/10A61B3/103A61B3/11A61B3/14A61H5/00
CPCA61B3/1015A61B3/1035A61H5/00A61B3/0008A61B3/0016A61B3/111A61B3/14A61H2205/024
Inventor 王清扬
Owner REYEMICO (ZHEJIANG) MEDICAL TECH LTD
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