Silicon wafer cleaning wastewater treatment system

Abstract

The invention discloses a silicon wafer cleaning wastewater treatment system. The system comprises overflow tank groups communicating with the downstream portions of cleaning machines, each overflow tank group comprises a plurality of rinsing tanks, chemical cleaning tanks and ultrasonic tanks, the downstream portions of the rinsing tanks communicate with transfer tanks, the downstream portions of the transfer tanks communicate with a pumping pipeline, and the pumping pipeline is provided with a water supply pump; and the downstream of the pumping pipeline communicates with a first main pipeline communicating with degumming machines and a second main pipeline communicating with sheet inserting machines, and the first main pipeline is connected with the second main pipeline in parallel. The system can fully recycle wastewater drained by the cleaning machine, effectively avoid resource waste and reduce waste water drainage pressure, and can supply water to the degumming machines, and the water temperature can meet the working requirements of the degumming machines.

Description

technical field [0001] The invention relates to the technical field of supporting systems for silicon wafer cleaning equipment, in particular to a silicon wafer cleaning wastewater treatment system. Background technique [0002] The current cleaning machine will produce a large amount of wastewater during the cleaning process of silicon wafers. The wastewater will be purified after being filtered by multiple rinsing tanks and finally discharged to the external environment. Due to the heavy workload of the equipment and the large amount of discharged water, The operating pressure of related wastewater treatment equipment is relatively high. [0003] On the other hand, the water temperature required for the operation of components such as the dosing tank and spray tank of the degumming machine is high temperature, and the water supplied to the degumming machine by the conventional system needs to be heated by a heating device, which will generate energy consumption. However, ...

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Problems solved by technology

[0002] The current cleaning machine will produce a large amount of wastewater during the cleaning process of silicon wafers. The wastewater will be purified after being filtered by multiple rinsing tanks and finally discharged to the external environment. Due to the heavy workload of the equipment and the large amount of discharged water, The operating pressure of related wastewater treatment equipment is relatively high

[0003] On the other hand, the water temperature required for the operation of components such as the dosing tank and spray tank of the degumming machine is high temperature, and the water supplied to the degumming machine by the conventional system needs to be heated by a heating device, which will generate energy consumption

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