Susceptor
A technology for bases and recesses, applied in the field of manufactured bases, can solve problems such as uneven wafer temperature and poor yield of semiconductor chips, and achieve the effects of reducing stress concentration, improving yield, and long life
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Embodiment 1
[0050] As Example 1 of the depression formed independently on the base, a figure 2 The depressed portion 2 shown in (a) and (b). That is, a susceptor coated with SiC on the surface of high-purity isotropic graphite was produced, and in this susceptor, the diameter of the depressed portion 2 was Six supporting parts 3 are provided in the recessed part 2, and six non-contact parts 5 are formed on the inner peripheral wall of the recessed part 2 adjacent to the formation position of the supporting part 3, and formed between the non-contact parts 5. There are six contact parts 4, and the length of one contact part 4 (circumferential length when viewing the recessed part from above) is 13 mm, and the ratio of the total circumferential length of the contact parts 4 on the circumference is about 50%. Then, if figure 2 As shown in (b), a semiconductor was manufactured using the above-mentioned susceptor on which the wafer 10 was placed on the recessed portion 2 .
Embodiment 2
[0052] As Example 2, such as Figure 4 As shown in (a) and (b), except that the diameter of the recessed part 2 In the same manner as in Example 1, except that the length of each contact portion 4 was 200 mm and the length of each contact portion 4 was 2 mm, a susceptor in which the total length of the contact portion 4 on the circumference was about 1.9% was produced to manufacture a semiconductor.
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Abstract
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