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Susceptor

A technology for bases and recesses, applied in the field of manufactured bases, can solve problems such as uneven wafer temperature and poor yield of semiconductor chips, and achieve the effects of reducing stress concentration, improving yield, and long life

Pending Publication Date: 2021-05-11
TOYO TANSO KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since conduction heat is applied to the wafer mounted on the pocket of the susceptor from the portion in contact with the pocket, between the outer peripheral portion in contact with the pocket and the central portion not in contact with the pocket, The temperature of the wafer tends to become non-uniform
Specifically, a temperature difference tends to occur in a region of about 3 mm from the outer periphery of the wafer toward the inner side, so the yield of semiconductor chips is poor.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0050] As Example 1 of the depression formed independently on the base, a figure 2 The depressed portion 2 shown in (a) and (b). That is, a susceptor coated with SiC on the surface of high-purity isotropic graphite was produced, and in this susceptor, the diameter of the depressed portion 2 was Six supporting parts 3 are provided in the recessed part 2, and six non-contact parts 5 are formed on the inner peripheral wall of the recessed part 2 adjacent to the formation position of the supporting part 3, and formed between the non-contact parts 5. There are six contact parts 4, and the length of one contact part 4 (circumferential length when viewing the recessed part from above) is 13 mm, and the ratio of the total circumferential length of the contact parts 4 on the circumference is about 50%. Then, if figure 2 As shown in (b), a semiconductor was manufactured using the above-mentioned susceptor on which the wafer 10 was placed on the recessed portion 2 .

Embodiment 2

[0052] As Example 2, such as Figure 4 As shown in (a) and (b), except that the diameter of the recessed part 2 In the same manner as in Example 1, except that the length of each contact portion 4 was 200 mm and the length of each contact portion 4 was 2 mm, a susceptor in which the total length of the contact portion 4 on the circumference was about 1.9% was produced to manufacture a semiconductor.

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Abstract

Provided is a susceptor that can improve the yield of semiconductor chips fabricated from a wafer, hardly causes chipping (chip), and has a long life. The susceptor has pockets (2) on which a wafer (10) is to be placed, wherein at least one of the pockets (2) has a plurality of supports (3) for supporting the wafer (10), a plurality of contact portions (4) that contacts a side surface (10a) of the wafer (10), and a plurality of non-contact portions (5) that does not contact the side surface (10a) of the wafer (10). The contact portions (4) and the non-contact portions (5) are formed alternately on an inner peripheral wall of the pocket (2), and at least two of the supports (3) are formed on a line connecting the center (O) of the pocket (2) and the non-contact portion (5) when the susceptor is viewed from above.

Description

technical field [0001] The present invention relates to susceptors for the manufacture of semiconductors. Background technique [0002] For example, in order to manufacture a good LED, it is important to uniformly progress the epitaxial growth of a thin film crystal layer laminated on the surface of a wafer to be a semiconductor chip. Therefore, in order to perform epitaxial growth and form a thin-film crystal layer with a uniform film thickness in susceptors used in semiconductor production, it is necessary to uniformly heat the wafer by applying conduction heat and radiant heat. However, since conduction heat is applied to the wafer mounted on the pocket of the susceptor from the portion in contact with the pocket, between the outer peripheral portion in contact with the pocket and the central portion not in contact with the pocket, The temperature of the wafer tends to become non-uniform. Specifically, a temperature difference tends to occur in a region of about 3 mm fr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/683C23C16/458H01L21/205
CPCC23C16/4581C23C16/4584C23C16/4585C23C16/46H01L21/68735H01L21/68771C23C16/4583H01L21/67103H01L21/6875H01L21/68785
Inventor 池尻贵宏
Owner TOYO TANSO KK