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Production method of metal electrode, metal electrode and display panel

A metal electrode and display panel technology, which is applied in the manufacture of circuits, electrical components, semiconductors/solid-state devices, etc., can solve the problem of metal electrodes being etched uncleanly, and achieve the effect of avoiding unclean etching

Pending Publication Date: 2021-06-29
BEIHAI HKC OPTOELECTRONICS TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The main purpose of this application is to provide a method for preparing a metal electrode, a metal electrode and a display panel, aiming to solve the technical problem of unclean etching in the preparation process of the metal electrode

Method used

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  • Production method of metal electrode, metal electrode and display panel
  • Production method of metal electrode, metal electrode and display panel
  • Production method of metal electrode, metal electrode and display panel

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Embodiment Construction

[0036] It should be understood that the specific embodiments described here are only used to explain the present application, and are not intended to limit the present application.

[0037] The thin film transistor is the core component of the display panel. In the preparation process of the metal electrode of the thin film transistor, the exemplary technology is to coat a photoresist on the metal thin film, and after exposure and development, use an etching process to pattern the metal thin film, The photoresist is further removed to pattern the metal electrode to obtain the metal electrode. The etching process includes dry etching and wet etching. Whether dry etching or wet etching is used, there may be over-etching and unclean etching. , disconnection, uneven etching or residual defects of etching solution, and when etching multiple layers of different metal electrode layers, the etching rate of the etching solution for different metal electrode layers is different, making i...

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Abstract

The invention discloses a production method of a metal electrode, the metal electrode and a display panel. The production method of the metal electrode comprises the following steps: forming a first photoresist layer above a substrate; carrying out patterning treatment on the first photoresist layer so as to expose parts of the substrate; depositing a first metal layer above the first photoresist layer and the exposed substrate; and stripping the first photoresist layer and the first metal layer covering the surface of the first photoresist layer. The technical problem that etching is not thorough in the metal electrode production process can be solved.

Description

technical field [0001] The present application relates to the field of display technology, in particular to a method for preparing a metal electrode, a metal electrode and a display panel. Background technique [0002] When preparing the metal electrode of the thin film transistor, it is necessary to use an etching process. Whether it is dry etching or wet etching, there is a technical problem that the etching is not clean during the preparation of the metal electrode. Contents of the invention [0003] The main purpose of the present application is to provide a method for preparing a metal electrode, a metal electrode and a display panel, aiming at solving the technical problem of unclean etching existing in the preparation process of the metal electrode. [0004] In order to achieve the above object, the application provides a method for preparing a metal electrode, the method for preparing the metal electrode comprising: [0005] forming a first photoresist layer over ...

Claims

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Application Information

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IPC IPC(8): H01L21/28H01L29/423H01L29/786
CPCH01L21/28008H01L29/42372H01L29/42384H01L29/78669
Inventor 鲜济遥周佑联许哲豪袁海江
Owner BEIHAI HKC OPTOELECTRONICS TECH CO LTD