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Preparation method of filter, filter

A filter and resonator technology, applied in the direction of impedance network, electrical components, etc., can solve the problems of limited filter application, high cost, and many raw materials

Active Publication Date: 2022-04-22
SUZHOU HUNTERSUN ELECTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] With the development of integration technology, the demand for miniaturization of filters is getting higher and higher; BAW filters, as a kind of miniaturized filters, occupy an important position in the field of filters; however, the existing BAW filters use Preparation by bonding requires more raw materials, longer production cycle, and higher cost, which seriously limits the further application of filters

Method used

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  • Preparation method of filter, filter
  • Preparation method of filter, filter
  • Preparation method of filter, filter

Examples

Experimental program
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preparation example Construction

[0029] figure 1 For a flow chart of a method for preparing a filter provided in an embodiment of the present invention, refer to figure 1 , the preparation method of the filter includes:

[0030] Step S10, providing a substrate, the substrate includes a central region A and an edge region B surrounding the central region A;

[0031] Specifically, the substrate can be, for example, silicon, quartz, sapphire, gallium nitride or silicon carbide, etc.; the substrate includes a central area and an edge area, and the central area is located in the middle of the substrate for setting a thin film resonator unit; The region is set at the edge of the substrate, and is used to set the encapsulation layer; the substrate has an acoustic reflection unit, and the acoustic reflection unit can be specifically a Bragg reflection layer, and each Bragg reflection layer corresponds to a thin film resonator unit; or, the acoustic reflection unit The reflection unit can also be a plurality of subs...

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PUM

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Abstract

The invention discloses a preparation method of a filter and a filter. The manufacturing method of the filter includes: providing a substrate, the substrate including a central region and an edge region surrounding the central region; forming at least two thin film resonator units located in the central region of the substrate; forming a film covering the thin film The cavity sacrificial layer of the resonator unit; an encapsulation layer is grown on the surface of the cavity sacrificial layer away from the substrate, and the encapsulation layer covers the cavity sacrificial layer and the edge region of the substrate; releasing the The cavity sacrificial layer is added to form the cavity. The embodiment of the present invention can save materials required for filter production, reduce production cycle and save cost.

Description

technical field [0001] The embodiments of the present invention relate to the technical field of filters, and in particular, to a method for preparing a filter and a filter. Background technique [0002] The filter can effectively filter out a certain frequency point or a certain frequency to obtain a signal with a frequency that meets the requirements, which has important applications in the field of modern electronic technology; [0003] With the development of integration technology, the demand for miniaturization of filters is getting higher and higher; BAW filters, as a kind of miniaturized filters, occupy an important position in the field of filters; however, the existing BAW filters use The method of bonding requires more raw materials, longer production cycle, and higher cost, which seriously limits the further application of the filter. Contents of the invention [0004] The invention provides a preparation method of a filter and a filter, so as to save the mate...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H03H3/02
CPCH03H3/02H03H2003/023
Inventor 吴明唐兆云王家友赖志国唐滨王矿伟刘海瑞杨清华
Owner SUZHOU HUNTERSUN ELECTRONICS CO LTD