Leakage test structure and leakage test method

Abstract

The present invention provides a leakage test structure and a leakage test method. The leakage test structure includes a substrate in which a first well region and a second well region are formed; A first shallow trench isolation structure between the second well region and the first well region, a first source and drain region formed in the first well region, a plurality of The second source and drain regions and the test gate are formed on the substrate. In the leakage test method, the design dimensions of a plurality of the leakage test structures are different, and each of the leakage test structures is tested, the leakage current in each of the leakage test structures can be obtained, and the leakage current in each of the leakage test structures can be obtained. The leakage current in the leakage test structure obtains the corresponding relationship between the design size and the leakage current in the leakage test structure, which can further reflect problems such as parasitic leakage caused by the internal design of the semiconductor device.

Description

technical field [0001] The invention relates to the technical field of integrated circuit manufacturing, in particular to a leakage test structure and a leakage test method. Background technique [0002] Semiconductor technology In the design of integrated circuits or the development of process technology platforms, it is usually necessary to use a variety of leakage test structures to reflect whether the circuit design and process capabilities of semiconductor devices are normal. Different leakage test structures can reflect different device characteristics. The characteristics improve circuit design or process in semiconductor devices. Leakage is a problem that cannot be ignored in semiconductor devices, especially the parasitic leakage of semiconductor devices. [0003] When testing the leakage of semiconductor devices, usually such as figure 1 The leakage test structure shown (more leakage test structures currently used in the industry), the leakage test structure incl...

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Problems solved by technology

[0004] The purpose of the present invention is to provide a leakage test structure and a leakage test method to solve the problem that the existing leakage test structure cannot reflect the parasitic leakage caused by the internal design of the semiconductor device

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