Flange for MPCVD cavity connection and MPCVD device

Abstract

The invention relates to a flange for MPCVD cavity connection and an MPCVD device. The flange comprises an upper flange, a lower flange, a shielding strip and a sealing ring; the upper flange is matched with the lower flange for fixing an MPCVD cavity; the lower flange is provided with an annular slot I, the width of the slot I is integer multiples of the half-wavelength of the microwave transmitted in a medium by taking a partition plate as the medium, and the slot I is used for the partition plate to be mounted; a slot II and a slot III are formed in the groove bottom of the slot I in the lower flange; the slot II and the slot III are concentric annular grooves, and the radius of the slot II is smaller than that of the slot III; and the slot II is used for the shielding strip to be mounted, and the slot III is used for the sealing ring to be mounted. The MPCVD device comprises the flange, an upper half cavity, a lower half cavity, the partition plate, a coaxial transmission section, a coaxial antenna and a growth table. According to the flange and the MPCVD device, vacuum sealing and microwave shielding can be achieved, aging of the sealing ring is slowed down, the situation that the sealing ring is burnt by microwave ignition is prevented, the influence of the flange on a microwave field is reduced, and ignition and secondary plasma generation are prevented.

Description

technical field [0001] The present application relates to the technical field of equipment connectors, in particular to a flange used for connecting MPCVD chambers and an MPCVD device. Background technique [0002] Microwave plasma chemical vapor deposition (MPCVD) technology has attracted more and more attention from the industry due to its advantages of high product quality, strong controllability, and no pollution. [0003] In the structure of conventional MPCVD equipment, microwaves are introduced into the cavity through the coaxial section, and are excited to generate plasma above the growth table for diamond synthesis. The cavity is divided into an upper half cavity and a lower half cavity, and the upper half cavity and the lower half cavity are separated by a medium with a lower dielectric constant (usually quartz glass). The upper half of the cavity is at normal pressure, and the lower half of the cavity is at low pressure, that is, the vacuum area. The flanges are...

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Problems solved by technology

[0004] However, the current connecting flange ensures the airtightness of the lower half of the cavity by adding a rubber ring under the glass, and the rubber ring is easily aged due to the influence of microwaves; by increasing the number of screws between the two flanges to prevent microwave leakage, Too many flange screws are likely to cause damage to the quartz glass; in addition, the existing flanges will form a strong electric field area at the top edge of the lower chamber, which will cause plasma instability

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