Quartz tube cleaning device and cleaning method

Abstract

The invention provides a quartz tube cleaning device and cleaning method. The quartz tube cleaning device comprises a cleaning cover with an opening in the bottom, a base movably assembled with the cleaning cover in an inserted mode in the vertical direction, a bearing table arranged in the base and hooping a quartz tube, and a driving device. A first nozzle is arranged at the top of the cleaning cover, a plurality of second nozzles are vertically arranged on the side wall of the cleaning cover, an inner spray pipe is vertically arranged on the bearing table, and a plurality of third nozzles are arranged at the top and the side of the inner spray pipe above the bearing table; a rotary sealing device is embedded in the base, and the inner spray pipe continuously penetrates through the bearing table and the rotary sealing device in the vertical direction; the driving device drives the bearing table to rotate, and the inner spraying pipe is kept static in the rotating process of the bearing table. By means of the quartz tube cleaning device, efficient cleaning operation on the quartz tubes of various sizes is achieved, the requirement for cleaning the quartz tubes of different diameters can be met, the structure of the quartz tube cleaning device is simplified, the service life is prolonged, and the quartz tubes are prevented from being damaged in the cleaning process.

Description

technical field [0001] The invention relates to the technical field of semiconductor equipment consumable cleaning equipment, in particular to a quartz tube cleaning device and cleaning method. Background technique [0002] Quartz tube is a semiconductor equipment consumable commonly used in semiconductor device manufacturing equipment (such as chemical vapor deposition (CVD), physical vapor deposition (PVD), diffusion equipment (Diff) or film formation equipment (T / F), etc.). After the quartz tube is used in the aforementioned semiconductor equipment for a period of time, a large amount of dirt, metal impurities or solid particles will remain on the inner wall surface. However, the quartz tube is expensive, so it needs to be reused after being thoroughly cleaned to reduce the manufacturing cost of semiconductor devices . [0003] After searching, the applicant found that the Chinese invention patent with publication number CN101181711A discloses an automatic vertical quart...

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Problems solved by technology

Therefore, when the tube nozzle at the top sprays deionized water (DIW) or cleaning agent into the opening of the quartz tube, the weight of the entire quartz tube will be huge, which will seriously affect the stability of the quartz tube when it is driven by the turntable and rotates. Sexuality and increase energy consumption, and there is a serious waste of deionized water

In addition, objectively, this cleaning device has a poor cleaning effect on the inner wall of the quartz tube due to the liquid stored in the quartz tube.

Secondly, because the prior art needs to be supported by the workpiece support on the turntable, the outer wall of the quartz tube in contact with the workpiece support is shielded by the workpiece support, resulting in the defect that the outer wall of the quartz tube cannot be effectively cleaned. Moreover, the turntable needs to withstand the huge pressure exerted by the quartz tube and the liquid stored in the quartz tube, which will easily cause the turntable to malfunction and cause damage to the turntable; finally, the applicant also pointed out that this prior art can only be used for one kind of The quartz tube with a specific diameter is cleaned, and the outer wall of the quartz tube will rub against the workpiece holder during the rotation process, which will cause scratches on the outer wall of the quartz tube during the cleaning process, and cannot meet the cleaning needs of quartz tubes with different diameters

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