151results about How to "Uniform cleaning effect" patented technology

A robot cleaner that cleans a cleaning region while traveling the cleaning region and a method to control the same are provided. The robot cleaner can uniformly clean a cleaning region based on a wall-following technique which allows the robot cleaner to travel along the outline of the cleaning region. The method selects, as a reference wall, a wall at a left or right side of the robot cleaner at a start position of the robot cleaner based on a left or right-based travel algorithm, which allows the robot cleaner to travel along a left or right wall, and controls the robot cleaner to travel the cleaning region in a zigzag travel pattern in which the robot cleaner moves a predetermined distance in a direction perpendicular to the reference wall at specific intervals along the selected reference wall while following the selected reference wall.

An apparatus for the cleaning of a turbine engine comprises a towable wash cart having a reservoir for cleaning fluid. The reservoir is connected through a pump system to a wash ring operatively mounted to the cart. The wash ring has a plurality of spray nozzles about its periphery arid positionably adjustable for directing an atomized spray of the cleaning fluid into an inlet of the engine. The cart and wash ring is aligned with the engine such that there is no physical contact between the wash ring and engine during the entirety of the cleaning process. While a preferred cleaning fluid is pure water, the reservoir may be segmented to carry a number of different cleaning solutions, which can be mixed in a manifold of the pump system as may be desired for a particular cleaning process. The reservoirs may be heated and insulated to maintain the cleaning solutions at an elevated temperature. A sluice cart may be provided to collect cleaning fluid draining fur the engine for delivery to a collection tank on the wash cart.

The invention discloses laser cleaning equipment for oil stain on a metallic surface. The laser cleaning equipment comprises a computer, a control cabinet, a laser, a galvanometer scanning system and an adjustable workbench, wherein the laser and the galvanometer scanning system are both connected to the computer through the control cabinet; the laser is capable of transmitting the generated laser beam into the galvanometer scanning system through a laser transmission fiber; the galvanometer scanning system comprises a reflecting lens, which is arranged in the galvanometer scanning system and is used for reflecting the laser, and a focusing lens, which is arranged at the bottom of the galvanometer scanning system; the workbench is arranged below the galvanometer scanning system. The laser cleaning equipment for the oil stain on the metallic surface, which is provided by the invention, has the advantages of high cleaning efficiency, low operating cost, energy conservation and environmental friendliness.

It is an object to provide a cleaning method in a CVD apparatus capable of efficiently removing a by-product such as SiO₂ or Si₃N₄ which is adhered to and deposited on the surfaces of an inner wall, an electrode and the like in a reaction chamber at a film forming step. Furthermore, it is an object to provide a cleaning method in which the amount of a cleaning gas to be discharged is very small, an influence on an environment such as global warming is also lessened and a cost can also be reduced. An energy is applied to a fluorine compound to react the fluorine compound, thereby generating a fluorine gas component and a component other than the fluorine gas component. Furthermore, the fluorine gas component and the component other than the fluorine gas component which are generated are separated from each other so that the fluorine gas component is separated and refined. After a film forming process for a base material is carried out by a CVD apparatus, a separated and refined fluorine gas is then converted to a plasma to remove a by-product adhered into the reaction chamber.

The invention relates to the technical field of tableware rotation cleaning and automatic tableware separation and overturn, in particular to a rotation dish washing machine and a tableware rotation cleaning method. The tableware rotation cleaning method and the dish washing machine are suitable for restaurants and families, can achieve an ideal cleaning effect every time from single tableware cleaning to batch tableware cleaning and from Chinese tableware cleaning to western tableware cleaning, and has no potential safety hazard.

The invention provides an automatic cleaning device for culture dishes. The automatic cleaning device comprises a base and a rotary disc. A brush cleaning region, an ultrasonic cleaning region, a clear water cleaning region and a drying region are uniformly arranged on the base circumferentially, rotatable brushes are installed in the brush cleaning region, an ultrasonic generator is installed in the ultrasonic cleaning region, and a groove of the ultrasonic cleaning region is filled with an ultrasonic cleaning medium. Multiple high-pressure nozzles for spraying water to the culture dishes are installed in the clear water cleaning region, and water outlets are formed in a groove where the clear water cleaning region is located. An infrared generator is installed in the drying region. The rotary disc comprises a tray, a rotating shaft and a climbing mechanism. The hollowed-out tray is installed on the top of the rotating shaft through a turning arm, and the rotating shaft is driven by a driving motor and through transmission of a gear at the bottom end to rotate by 90 degrees every time. The automatic cleaning device has four stations, operation from cleaning to drying can be achieved in the device, basic functions of cleaning and washing can be achieved, the washing effect is better than a traditional manual washing effect, and the culture dishes are washed and cleaned more uniformly.

A substrate cleaning apparatus cleans a surface of a substrate such as a semiconductor wafer and dries the substrate. The substrate cleaning apparatus includes a process chamber having a substrate conveying unit configured to hold a substrate horizontally with its upper surface facing upwardly and to convey the substrate in one direction, and a cleaning unit configured to clean the surface of the substrate in non-contact state by supplying a cleaning liquid to the surface of the substrate which is moving in the process chamber. The substrate apparatus has an inert gas blowing unit configured to blow an inert gas toward the front and reverse surfaces of the substrate which has been cleaned in the cleaning unit to produce an inert gas atmosphere in the process chamber while drying the substrate with the inert gas.

A film formation apparatus for a semiconductor process includes a support member having a plurality of support levels configured to support target substrates inside a reaction chamber; a film formation gas supply system configured to supply a film formation gas into the reaction chamber and including a gas distribution nozzle; a cleaning gas supply system configured to supply a cleaning gas for etching a by-product film deposited inside the reaction chamber; and an exhaust system configured to exhaust gas from inside the reaction chamber. The cleaning gas supply system includes a gas nozzle disposed near a bottom of the reaction chamber and having a gas supply port at its top directed upward, and the gas supply port is located below the lowermost one of the support levels of the support member.

An object is to provide a high-frequency plasma generating apparatus and process which can further advance uniformity of the thickness of a film on a substrate with a large area in comparison with conventional apparatuses. In a reaction chamber (1), a ground electrode (3) is disposed, and a discharge electrode (2) is disposed opposite to the ground electrode (3). A substrate (4) as a processing object is placed in close contact with the ground electrode (3). A high-frequency voltage is applied to the discharge electrode (2) so as to generate plasma between the ground electrode and the discharge electrode. An RF electric power supply (15) generates a first high-frequency voltage, and outputs the generated voltage on feeding points (9) disposed on a lateral portion of the discharge electrode (2). An RF electric power supply (16) generates a second high-frequency voltage, and outputs the generated voltage on feeding points (9) disposed on another lateral portion of the discharge electrode (2). Here, the second high-frequency voltage has the same frequency as that of the first high-frequency voltage and has a phase which varies with a low-frequency signal, which is modulated by a predetermined modulation signal.

A turntable with an abrasive cloth mounted thereon and a top ring positioned above the turntable are independently rotatably provided. The top ring holds a workpiece to be polished and presses the workpiece against the abrasive cloth. The turntable and the top ring are rotated to polish the surface of the workpiece to a flat mirror finish on the abrasive cloth. A rotatable brush pressed against the abrasive cloth is rotated about an axis substantially perpendicularly to the plane of the abrasive cloth, and oscillated substantially radially between radially inner and outer positions over the abrasive cloth. A cleaning solution is sprayed from a nozzle onto the abrasive cloth. The turntable has a bank along an outer circumferential edge thereof for preventing a protective solution, which is supplied to the abrasive cloth to keep the abrasive cloth wet and prevent it, from flowing off the turntable when the turntable is stationary.

The invention discloses an automobile chassis cleaning and baking device which mainly comprises a frame, a motor, a rocker and rotating nozzles, wherein a long slot is formed on the upper part of the frame, and a shaft A and a shaft B are arranged on the frame; the shaft of the motor is provided with a drive wheel; the shaft A is provided with a driven wheel; a conveyor belt is sleeved on the drive wheel and the driven wheel; the driven wheel is provided with an eccentric shaft; the eccentric shaft and the shaft B are respectively provided with a slide block; the slide blocks on the eccentric shaft and the shaft B are arranged in a chute of the rocker; the upper part of the rocker is provided with a sliding wheel shaft; the sliding wheel shaft is provided with a sliding wheel; the sliding wheel is positioned in the long slot; a nozzle seat is arranged on the top of the rocker; and a plurality of rotating nozzles are uniformly distributed on the nozzle seat. The automobile chassis cleaning and baking device has a simple structure and is convenient for operation; the rotating nozzles spray water in a rotating manner to comprehensively clean an automobile chassis along with uniform cleaning strength and good cleaning effect; and the rotating nozzles inject gas to bake the automobile chassis along with good baking effect.

An apparatus for cleaning a gun barrel having striations is provided, which can uniformly clean an inner surface of the gun barrel by making cleaning members in contact with the inner surface of the gun barrel. The apparatus includes a cleaning device being in contact with the inner surface of the gun barrel as it is moved by a drive device installed inside a cylindrical main body. The cleaning device includes a plurality of divided plates dividedly provided inside the gun barrel in the form of a saddle and being slanted to correspond to a slope of the striations, cleaning members fixed to outer peripheries of the respective divided plates and being in contact with the inner surface of the gun barrel, a cam device converting a rotation of a drive motor installed inside the main body into a rectilinear movement in order to move the respective divided plates upward/downward, and a direction changing part coupling the cam device to the divided plates so that the divided plates go and return along the striations formed on the inner surface of the gun barrel and distributing a frictional force according to the movement of the divided plates forward/backward.

The invention relates to an electric vehicle cleaning device. The electric vehicle cleaning device comprises a concave support, and two installation lugs are symmetrically arranged at the two ends of the concave support; a rotating motor is installed on the inner wall of the left end of the concave support through a motor base, a lead screw is connected to an output shaft of the rotating motor, the right end of the lead screw is installed on the inner wall of the right side of the concave support through a bearing, and the lead screw is driven to rotate through the rotating motor; a moving block is installed in the middle of the lead screw in a threaded connection mode, two linear slide rails are installed on the lower end face of the moving block and symmetrically installed on the inner wall of the concave support through screws, and the linear slide rails play a role of limiting the motion direction of the moving block; a rigid support device is installed on the upper end face of the moving block, and a high pressure cleaning device is installed on the upper end face of the rigid support device. According to the electric vehicle cleaning device, stable automated rotating and cleaning functions of new energy vehicles can be achieved, and the electric vehicle cleaning device has the advantages of being good in rigid support performance, free of manual cleaning, high in degree of automation, good in cleaning effect, uniform in degree of washing and the like.

The invention discloses a building body rosa multiflora green plant exterior wall, and belongs to the building appearance equipment technical field; the building body rosa multiflora green plant exterior wall comprises two isolation wall bodies arranged in opposite on side faces of the building body; the isolation body is provided with a guide mechanism, and is a netted wall body made of flexible material; the outer side of the bottom of the isolation wall body is provided with a rosa multiflora green plant culture box; a washing irrigation structure is arranged between the culture box and the isolation wall body top; the top of the isolation wall body is provided with a draw-off mechanism; the building body rosa multiflora green plant exterior wall is reasonable in design; the draw-off mechanism can draw the isolation wall body to move up and down on vertical guiderails and slope guiderails of a guide mechanism; a drive gear in middle of the washing irrigation structure is engaged with tooth grooves evenly arranged in the inner side face of a driven guide block middle notch; the building body rosa multiflora green plant exterior wall is high in stability, and can evenly irrigate and wash the rosa multiflora green plants.

A method and equipment for washing the medical or medicinal rubber plugs features that the high-pressure liquid stream is used to flush said rubber plugs downward, so the rubber plugs are cleaned in semi-suspended or suspended state. Its equipment is composed of container with multiple water spraying holes on its bottom and side wall, washing drum, water storage, water inlet pipe, water outlet pipe, and the pressurizing pump and pressure regulating valve for spraying the cleaning liquid from water spraying holes.

An intermediate transfer belt cleaning unit includes a cleaning blade put in sliding contact with the surface of a circulating intermediate transfer belt and a blade holder for holding the blade, the cleaning blade having a length extending across the width of the intermediate transfer belt, the blade holder being formed along the full length of the cleaning blade, for cleaning the surface of the intermediate transfer belt by means of the cleaning blade. In this cleaning unit, the contact pressure of the cleaning blade against the intermediate transfer belt is adjusted so that the contact pressure around both the side edges of the intermediate transfer belt is higher than the contact pressure in the remaining part.

A plasma apparatus for vapor phase etching and cleaning, includes a reactor body configured to process a substrate; a direct plasma generation area in the reactor body, into which a process gas is introduced and in which plasma is directly induced to disassociate the process gas; a substrate processing area in the reactor body in which the substrate is processed by reactive species produced by reacting the disassociated process gas introduced from the direct plasma generation area with a vaporised gas introduced from the outside of the reactor body; a plasma induction assembly configured to induce plasma in the direct plasma generation area; and a gas distribution baffle, disposed between the direct plasma generation area and the substrate processing area, having a plurality of through holes through which the disassociated process gas is introduced from the direct plasma generation area to the substrate processing area.