Hybrid process control method and device, equipment and medium

A control method and mixed system technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as economic losses, machine idleness, manual operation errors or missing, etc., to avoid machine stoppage, avoid The effect of production loss

Pending Publication Date: 2021-11-16
CHANGXIN MEMORY TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Manual operations are prone to operational errors or omissions, resulting in unnecessary economic losses
In addition, the etching process has different processes running in the same machine cavity. It is necessary for the machine to stop the current process and then switch to the new etching process, resulting in idle machines and loss of production capacity.

Method used

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  • Hybrid process control method and device, equipment and medium
  • Hybrid process control method and device, equipment and medium
  • Hybrid process control method and device, equipment and medium

Examples

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Embodiment Construction

[0045] In order to facilitate the understanding of the present application, the present application will be described more fully below with reference to the relevant drawings. Preferred embodiments of the application are shown in the accompanying drawings. However, the present application can be embodied in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the understanding of the disclosure of the application more thorough and comprehensive.

[0046] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field to which this application belongs. The terms used herein in the specification of the application are only for the purpose of describing specific embodiments, and are not intended to limit the application. As used herein, the term "and / or" includes any and all combinati...

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PUM

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Abstract

The embodiment of the invention relates to a hybrid process control method and device, equipment and a medium. The method comprises the steps of: obtaining hybrid process operation groups related to the process formula of an etching cavity in etching equipment, and enabling different process formulas to correspond to different hybrid process operation groups; obtaining conversion rules of the different hybrid process operation groups; and controlling the etching equipment to be automatically switched to a target hybrid process operation group associated with a goods-ordering process formula according to the goods-ordering process formula of the real-time goods-ordering requirement of the target etching cavity and the requirement of the conversion rules. In the switching process, manual participation is not needed, the machine does not need to stop the operation technological process, and economic losses caused by machine production halt and manual operation errors or missing in the process switching period are avoided.

Description

technical field [0001] The embodiments of the present application relate to the technical field of semiconductor manufacturing, and in particular to a hybrid process control method, device, equipment, and medium. Background technique [0002] With the rapid development of integrated circuit manufacturing technology, the market demand for semiconductor products is getting higher and higher, which puts forward higher requirements for the production efficiency and shipment quality of semiconductor production lines. The etching process is one of the key links in the semiconductor production process, and its efficiency and shipment yield directly affect the shipment efficiency and yield of semiconductor products. The etching process in the semiconductor industry generally adopts multi-cavity and multi-process switching production processes to improve the production efficiency and utilization of etching equipment. [0003] In the traditional etching process, the multi-cavity and ...

Claims

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Application Information

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IPC IPC(8): H01L21/67
CPCH01L21/67276H01L21/67069G05B2219/45212G05B19/042Y02P90/02G05B19/4155
Inventor 赵行乐汪玉明孙正庆
Owner CHANGXIN MEMORY TECH INC
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