A method for preparing gradient structure amorphous film based on high temperature ion irradiation

An ion irradiation, amorphous thin film technology, used in ion implantation plating, final product manufacturing, sustainable manufacturing/processing, etc. The advantages of strength are weakened, and the strength of amorphous alloys is reduced, so as to achieve the effect of unique superiority, high strength and good plastic deformation ability.

Active Publication Date: 2022-06-07
XI AN JIAOTONG UNIV
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Problems solved by technology

Although this approach can greatly improve the plastic deformation ability of amorphous alloys, there are still two unavoidable defects: first, the composition, grain size and volume fraction of the crystal phase formed in amorphous alloys are not easy to control Secondly, although the prepared amorphous / crystalline composites have better plastic deformation ability than single-phase amorphous alloys, their strength tends to decline, that is, the advantages of high strength of amorphous alloys are weakened.
This method has the same problem as the above method: while improving the plastic deformation ability of the amorphous alloy, it will lead to a decrease in the strength of the amorphous alloy

Method used

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  • A method for preparing gradient structure amorphous film based on high temperature ion irradiation
  • A method for preparing gradient structure amorphous film based on high temperature ion irradiation
  • A method for preparing gradient structure amorphous film based on high temperature ion irradiation

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Embodiment Construction

[0025] The present invention designs a method based on high temperature ion irradiation treatment for W 65 Ni 35 (at.%) The method of structural modification of the amorphous film to make it present a gradient structure of "hard surface and core toughness". On the basis of the high-quality amorphous film prepared by magnetron sputtering, through the combined action of high temperature and ion irradiation, a large number of helium bubbles are injected into the interior of the sample, but the amorphous structure is still maintained, and the surface appears obvious crystal phase. The samples with this gradient structure exhibit significantly better hardness and plastic deformation ability than the samples before irradiation. It specifically includes the following steps:

[0026] 1) The single-sided polished monocrystalline silicon (100) substrate was ultrasonically cleaned with acetone, alcohol and distilled water, then dried with a hair dryer, placed on the substrate table of...

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Abstract

The invention discloses a method for preparing an amorphous film with a gradient structure based on high-temperature ion irradiation. On the basis of a high-quality amorphous film plated by magnetron sputtering, high-temperature ion irradiation treatment is supplemented to make the surface of the sample Crystallization and maintaining an amorphous structure inside, thereby preparing a high-strength, high-plasticity amorphous film with a gradient structure. The gradient amorphous film structure prepared by the invention can be easily realized by controlling the temperature and implantation dose of the ion irradiation experiment, thus providing the possibility of preparing controllable high-mechanical property amorphous film materials.

Description

technical field [0001] The invention belongs to the technical field of nano-metal thin film materials, and particularly relates to a method for preparing high-strength and high-plasticity gradient structure amorphous thin films based on high-temperature ion irradiation. Background technique [0002] Different from crystalline materials, amorphous alloys have the characteristics of long-range disorder and short-range order of atomic arrangement, which makes the strength and plastic deformation of amorphous alloys significantly different from crystalline materials. On the one hand, the strength of amorphous alloys is significantly higher than that of crystalline materials, making amorphous alloys one of the hot spots in the research and development of engineering materials. On the other hand, due to the lack of plastic deformation carriers such as dislocations in the crystal, the plastic deformation of amorphous alloys is usually concentrated in highly localized shear bands, a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/16C23C14/58C23C14/35C22F3/00C22C45/10
CPCC23C14/165C23C14/5826C23C14/352C22F3/00C22C45/10C22C2200/02Y02P70/50
Inventor 黄平王飞黄丽
Owner XI AN JIAOTONG UNIV
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