A method for preparing gradient structure amorphous film based on high temperature ion irradiation
An ion irradiation, amorphous thin film technology, used in ion implantation plating, final product manufacturing, sustainable manufacturing/processing, etc. The advantages of strength are weakened, and the strength of amorphous alloys is reduced, so as to achieve the effect of unique superiority, high strength and good plastic deformation ability.
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[0025] The present invention designs a method based on high temperature ion irradiation treatment for W 65 Ni 35 (at.%) The method of structural modification of the amorphous film to make it present a gradient structure of "hard surface and core toughness". On the basis of the high-quality amorphous film prepared by magnetron sputtering, through the combined action of high temperature and ion irradiation, a large number of helium bubbles are injected into the interior of the sample, but the amorphous structure is still maintained, and the surface appears obvious crystal phase. The samples with this gradient structure exhibit significantly better hardness and plastic deformation ability than the samples before irradiation. It specifically includes the following steps:
[0026] 1) The single-sided polished monocrystalline silicon (100) substrate was ultrasonically cleaned with acetone, alcohol and distilled water, then dried with a hair dryer, placed on the substrate table of...
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