Magnetic tunnel junction micro-tension detector
A magnetic tunnel junction and detector technology, which is applied in the direction of measurement of the change force of the magnetic property of the material caused by the applied stress, can solve the problems of low sensitivity of the tension detector and cannot meet the detection of small tension, and achieve high sensitivity Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0020] The invention provides a magnetic tunnel junction micro-tension detector, such as figure 1 As shown, it includes an antiferromagnetic part 1 , a pinning part 2 , a barrier part 3 , a free layer part 4 , a first force applying part 5 and a second force applying part 6 . The material of the antiferromagnetic part 1 is a hard magnetic antiferromagnetic material, specifically, the material of the antiferromagnetic part 1 is IrMn, PtMn, FeMn. The pinning part 2 is placed on the antiferromagnetic part 1 . The material of the pinning part 2 is a metal or semimetal with high spin polarizability, specifically, the material of the pinning part 2 is Co, Fe, CoFe, CoFeB, CoFeAl alloy. The barrier portion 3 is placed on the pinning portion 2 . The material of the barrier portion 3 is aluminum oxide or magnesium oxide. The free layer portion 4 is placed in the middle on the barrier portion 3 . The material of the free layer portion 4 is a soft magnetic material with weak magnetic...
Embodiment 2
[0024] On the basis of Embodiment 1, the first force application part 5 and the second force application part 6 are respectively fixedly connected to opposite side surfaces of the free layer part 4 . That is to say, in addition to the first force applying part 5 and the second force applying part 6 being fixed on the barrier part 3 , the first force applying part 5 and the second force applying part 6 are also fixedly connected to the free layer part 4 . In this way, the micro-tension not only changes the stress in the barrier part 3, but also changes the stress in the free layer part 4, thereby not only changing the quantum tunneling characteristics of the potential barrier part 3, but also changing the stress in the free layer part 4. The internal spin state changes the magnetoresistance of the magnetic tunnel junction more, thereby achieving higher sensitivity micro-pull force detection.
Embodiment 3
[0026] On the basis of Example 1, such as figure 2 As shown, it also includes a first elastic part 7 and a second elastic part 8, the first elastic part 7 and the second elastic part 8 are arranged on the opposite sides of the pinning part 2 on the antiferromagnetic part 1, and the barrier part 3 is placed On the first elastic part 7, the pinning part 2, and the second elastic part 8, the first force applying part 5 and the second force applying part 6 are respectively fixed on the barrier part 3. The first elastic part 7 and the second elastic part 8 on the upper side. The height of the first elastic part 7 and the second elastic part 8 is the same as that of the pinning part 2 . The first elastic part 7 and the second elastic part 8 are elastic insulating materials. The material of the first elastic part 7 and the second elastic part 8 can be elastic fiber or rubber. In this way, the contact area of the pinning part 2 to the barrier part 3 is reduced, thereby reducing ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com