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Manufacturing method of quantum dot film and quantum dot substrate

A technology of quantum dot film and manufacturing method, which is applied in semiconductor/solid-state device manufacturing, electrolytic coating, electrophoretic plating, etc., can solve the problems that quantum dot materials are difficult to present a single charge and difficult to produce morphology.

Active Publication Date: 2021-12-17
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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Problems solved by technology

[0005] The embodiment of the present application provides a method for manufacturing a quantum dot film and a quantum dot substrate, which can solve the problem that the quantum dot material is difficult to exhibit the characteristics of a single charge, which makes it difficult to produce a quantum dot film with good shape and uniform thickness by means of electrophoretic deposition. question

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  • Manufacturing method of quantum dot film and quantum dot substrate
  • Manufacturing method of quantum dot film and quantum dot substrate
  • Manufacturing method of quantum dot film and quantum dot substrate

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Embodiment Construction

[0030] The following will clearly and completely describe the technical solutions in the embodiments of the application with reference to the drawings in the embodiments of the application. Apparently, the described embodiments are only some of the embodiments of the application, not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts belong to the scope of protection of this application.

[0031] Embodiments of the present application provide a method for manufacturing a quantum dot film and a quantum dot substrate. Each will be described in detail below. It should be noted that the description sequence of the following embodiments is not intended to limit the preferred sequence of the embodiments. In addition, in the description of the present application, the term "including" means "including but not limited to". The terms first, second, third, etc. are used for designation o...

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Abstract

The embodiment of the invention discloses a manufacturing method of a quantum dot film and a quantum dot substrate, the manufacturing method of the quantum dot film comprises the following steps: providing a quantum dot colloid and a polar solvent, mixing and modifying the quantum dot colloid and the polar solvent to obtain a quantum dot solution, providing an electrode substrate, and immersing the electrode substrate into the quantum dot solution; and depositing quantum dots in the quantum dot solution on the electrode substrate in an electrophoretic deposition mode, so that a quantum dot film is formed on the electrode substrate. The technical problem that a quantum dot film with good morphology and uniform thickness is difficult to manufacture in an electrophoretic deposition mode due to the fact that a quantum dot material is difficult to present the characteristic of single charge can be solved.

Description

technical field [0001] The present application relates to the field of display technology, in particular to a method for manufacturing a quantum dot film and a quantum dot substrate. Background technique [0002] At present, the processing methods of quantum dot (Quantum Dot, QD) color film are mainly photolithography and inkjet printing. A new quantum dot patterning method to improve the quality and processing efficiency of quantum dot films and devices. [0003] The method of electrophoretic deposition to prepare quantum dot film is to use charged quantum dot material to move in a specific direction under the action of an electric field and selectively deposit quantum dot film on a specific electrode. It has the advantages of simple preparation method and high efficiency, but electrophoresis The method of depositing quantum dot film has higher requirements on the material system. Because quantum dot materials suitable for electrophoretic deposition need to have more char...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L51/56C25D13/12C25D13/02
CPCC25D13/02C25D13/12H10K71/15H10K71/00
Inventor 石志清
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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