Gel-texture moisturizing and repairing mask

A texture and gel technology, applied in the field of daily chemical products, can solve the problems of single function and poor effect of the mask, and achieve good anti-inflammatory effect, obvious effect and skin moisturizing effect

Pending Publication Date: 2022-02-18
山东可欣生物科技有限公司
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] There are a wide variety of facial masks on the market. With the continuous maturity of the facial mask market, people have

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] A moisturizing and repairing facial mask with a gel texture, comprising the following components by weight percentage: 10% moisturizing agent, the moisturizing agent includes glycerin, sugar isomers, 1,2-hexanediol; 0.5% An aqueous solution of viscosifier comprising ammonium acryloyldimethyltaurate / VP copolymer, carbomer and cellulose gum; 0.05% skin conditioning emollient moisturizer, said skin conditioning emollient moisturizer Includes Caprylic Glycerin, Purslane Extract, and Scutellaria Root Extract; 3% Other Skin Conditioning Agents Including Dimethicone, Willow Bark Extract, Butylene Glycol, Accumulate Snowwort Extract, Peony Root Extract, Chamomile Flower Extract, Ethylhexylglycerin, Sodium DNA, Oregano Leaf Extract, Japanese Cypress Leaf Extract, Lactobacillus / Soybean Ferment Extract, Cinnamon Bark Extract and Silk amino acids; 0.05% pH adjusting ingredients, said pH adjusting ingredients include potassium hydroxide, sodium citrate and citric acid; 0.5% surface ...

Embodiment 2

[0024] A moisturizing and repairing facial mask with a gel texture, comprising the following components by weight percentage: 10.5% moisturizing agent, the moisturizing agent includes glycerin, sugar isomers, 1,2-hexanediol; An aqueous solution of viscosifier comprising ammonium acryloyldimethyltaurate / VP copolymer, carbomer and cellulose gum; 1% skin conditioning emollient moisturizer, said skin conditioning emollient moisturizer Includes Glyceryl Caprylate, Portulaca Oleracea Extract, and Scutellaria Root Extract; 10% Other Skin Conditioning Agents Including Dimethicone, White Willow Bark Extract, Butylene Glycol, Accumulate Snowwort Extract, Peony Root Extract, Chamomile Flower Extract, Ethylhexylglycerin, Sodium DNA, Oregano Leaf Extract, Japanese Cypress Leaf Extract, Lactobacillus / Soybean Ferment Extract, Cinnamon Bark Extract and Silk amino acids; 0.06% pH adjusting ingredients, the pH adjusting ingredients include potassium hydroxide, sodium citrate and citric acid; 1%...

Embodiment 3

[0026] A moisturizing and repairing facial mask with a gel texture, comprising the following components by weight percentage: 74.70731% of water, 11.24625% of butylene glycol, 10% of glycerin, 2% of polydimethylsiloxane, and 200.8% of polysorbate , Centella asiatica extract 0.19005%, peony root extract 0.19%, ammonium acryloyldimethyl taurate / VP copolymer 0.18%, carbomer 0.17%, 1,2-hexanediol 0.1615%, chamomile flower Extract 0.095%, Glycerin Caprylate 0.076%, Potassium Hydroxide 0.0578%, Cellulose Gum 0.05%, Ethylhexylglycerin 0.03326%, DNA Sodium 0.01%, Sugar Isomers 0.0055%, Methyl Diiso Propylpropionamide 0.002%, White Willow Bark Extract 0.001%, Oregano Leaf Extract 0.001%, Japanese Cypress Leaf Extract 0.001%, Lactobacillus / Soybean Fermentation Product Extract 0.0005%, Purslane Extract 0.0005%, Scutellaria baicalensis root extract 0.0005%, cinnamon bark extract 0.0005%, silk amino acids 0.0001%, sodium citrate 0.00005%, citric acid 0.00005%, EDTA disodium 0.02%, phenoxye...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a gel-texture moisturizing and repairing mask. The gel-texture moisturizing and repairing mask comprises: a moisturizing agent; an aqueous tackifier solution; a skin conditioning and moisturizing moisturizer, which comprises glycerol caprylate, a purslane extract and a scutellaria baicalensis root extract; other skin conditioners, which comprise polydimethylsiloxane, a white willow bark extract, butanediol, a centella asiatica extract, a peony root extract, a chamomilla recutita flower extract, ethylhexylglycerin, sodium DNA, an oregano leaf extract, a Japan cypress leaf extract, a lactobacillus/soybean fermentation product extract, a cinnamon bark extract and silk amino acids; and a solvent pure water, which is a balancing component. According to the invention, the effects of preserving moisture, supplementing water, whitening and nourishing the skin, lifting and tightening the skin, resisting aging and the like are integrated; and through synergistic cooperation of various plant extracts, moisturizing effect is obvious, the skin can be repaired and moistened, the phenomena of dryness and water shortage are improved, the moisturizing capacity of the skin is enhanced, and the immunity and antioxidant capacity of the skin are improved.

Description

technical field [0001] The invention relates to the technical field of daily chemical products, in particular to a moisturizing and repairing facial mask with a gel texture. Background technique [0002] With the development of society, people use various cosmetics for daily skin care, and facial masks play an important role in the skin care process. The principle of the mask is to use the short time covered on the face to temporarily isolate the outside air and pollution, increase the temperature of the skin to expand the pores of the skin, promote the secretion and metabolism of sweat glands, increase the oxygen content of the skin, and help the skin to eliminate epidermal cells. The products of metabolism and accumulated oily substances, the moisture in the mask penetrates into the stratum corneum of the epidermis, the skin becomes soft, and the skin is naturally bright and elastic. Factors such as air conditioning, environmental pollution, temperature changes and pressu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): A61K8/9789A61K8/37A61K8/891A61K8/34A61K8/60A61K8/9761A61K8/99A61K8/44A61K8/19A61K8/02A61K8/04A61Q19/00A61Q19/02A61Q19/08A61P29/00
CPCA61K8/9789A61K8/375A61K8/891A61K8/345A61K8/606A61K8/9761A61K8/99A61K8/44A61K8/19A61K8/0212A61K8/042A61Q19/00A61Q19/02A61Q19/08A61Q19/007A61P29/00A61K2800/5922A61K2800/85
Inventor 杨干张建广
Owner 山东可欣生物科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products