Plasma generating device

A plasma and generation device technology, applied in the field of plasma, can solve the problems of unsatisfactory plasma radial uniformity, low plasma density, low power coupling efficiency, etc., achieve good radial uniformity, improve ionization efficiency, The effect of simple installation

Pending Publication Date: 2022-03-08
DALIAN UNIV OF TECH
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  • Claims
  • Application Information

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Problems solved by technology

However, under low pressure, the power coupling efficiency of traditional capacitively coupled plasma is low, and the generated plasma has low density and thick sheath
Moreover, the capacitive sheath of radio frequency oscillation will excite high-order electromagnetic waves inside the plasma, which will lead to unsatisfactory radial uniformity of the plasma

Method used

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Embodiment Construction

[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0032] The purpose of the present invention is to provide a plasma generating device, which utilizes a uniform magnetic field to make electrons perform cyclotron motion, and at the same time generates a radio frequency electric field between the first grid and the second grid to accelerate the electrons, and then ionizes to generate plasma. Simple and low cost, and greatly improve the ionization efficiency.

[0033] In order to make the above objects, features...

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Abstract

The invention relates to a plasma generation device, which relates to the technical field of plasmas and comprises a first grid electrode, a second grid electrode and a magnetic field generation component, the first grid electrode and the second grid electrode are arranged in parallel, and a first distance is arranged between the first grid electrode and the second grid electrode; the first distance is a distance of Debye length magnitude; the first grid is connected with the power supply assembly; the magnetic field generating component is used for generating a magnetic field parallel to the first grid; during working, the power supply assembly applies radio frequency voltage to the first grid electrode, so that a first alternating electric field is generated between the first grid electrode and the second grid electrode, electrons in the first alternating electric field enter the magnetic field after resonance acceleration, and then rotate back to the first alternating electric field in the magnetic field to continue resonance acceleration so as to generate plasma; the period of the first alternating electric field is the same as that of the magnetic field. The plasma generator is high in discharge efficiency under low air pressure, and can generate plasmas with good radial uniformity.

Description

technical field [0001] The invention relates to the field of plasma technology, in particular to a plasma generating device. Background technique [0002] In the existing plasma etching process, a directional ion beam is usually generated under low pressure (<10 mTorr). However, under low pressure, the power coupling efficiency of traditional capacitively coupled plasmas is low, resulting in low density plasmas and thick sheaths. Moreover, the capacitive sheath of radio frequency oscillation will excite high-order electromagnetic waves inside the plasma, which will lead to unsatisfactory radial uniformity of the plasma. [0003] Therefore, there is an urgent need for a new type of plasma generating device to solve the above problems. Contents of the invention [0004] An object of the present invention is to provide a plasma generating device which has high discharge efficiency at low pressure and can generate plasma with good radial uniformity. [0005] To achieve t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/32
CPCH01J37/32651H01J37/32366
Inventor 孙景毓张权治温慧刘永新王友年
Owner DALIAN UNIV OF TECH
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