Plasma generating device

Abstract

The invention relates to a plasma generation device, which relates to the technical field of plasmas and comprises a first grid electrode, a second grid electrode and a magnetic field generation component, the first grid electrode and the second grid electrode are arranged in parallel, and a first distance is arranged between the first grid electrode and the second grid electrode; the first distance is a distance of Debye length magnitude; the first grid is connected with the power supply assembly; the magnetic field generating component is used for generating a magnetic field parallel to the first grid; during working, the power supply assembly applies radio frequency voltage to the first grid electrode, so that a first alternating electric field is generated between the first grid electrode and the second grid electrode, electrons in the first alternating electric field enter the magnetic field after resonance acceleration, and then rotate back to the first alternating electric field in the magnetic field to continue resonance acceleration so as to generate plasma; the period of the first alternating electric field is the same as that of the magnetic field. The plasma generator is high in discharge efficiency under low air pressure, and can generate plasmas with good radial uniformity.

Description

technical field [0001] The invention relates to the field of plasma technology, in particular to a plasma generating device. Background technique [0002] In the existing plasma etching process, a directional ion beam is usually generated under low pressure (<10 mTorr). However, under low pressure, the power coupling efficiency of traditional capacitively coupled plasmas is low, resulting in low density plasmas and thick sheaths. Moreover, the capacitive sheath of radio frequency oscillation will excite high-order electromagnetic waves inside the plasma, which will lead to unsatisfactory radial uniformity of the plasma. [0003] Therefore, there is an urgent need for a new type of plasma generating device to solve the above problems. Contents of the invention [0004] An object of the present invention is to provide a plasma generating device which has high discharge efficiency at low pressure and can generate plasma with good radial uniformity. [0005] To achieve t...

AI Technical Summary

Problems solved by technology

However, under low pressure, the power coupling efficiency of traditional capacitively coupled plasma is low, and the generated plasma has low density and thick sheath

Moreover, the capacitive sheath of radio frequency oscillation will excite high-order electromagnetic waves inside the plasma, which will lead to unsatisfactory radial uniformity of the plasma

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