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Vacuum processing device

A technology of vacuum processing device and vacuum chamber, which is applied in the manufacture of electrical components, semiconductor/solid-state devices, circuits, etc. It can solve the problems affecting the normal driving of the movement accuracy of the stage, and achieve the effect of suppressing frictional heat

Pending Publication Date: 2022-03-18
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since there is no air convection in the vacuum chamber, the generation of heat or dust tends to affect the movement accuracy of the stage and the normal drive of the drive mechanism of the lift pins, thus becoming a problem

Method used

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  • Vacuum processing device
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Embodiment Construction

[0044] Embodiments will be described below with reference to the drawings. In the following embodiments, detailed features and the like are shown for explaining technology, but these are merely examples, and not all of these features are necessarily essential to make the embodiments possible.

[0045] In addition, the drawings are diagrams schematically shown, and for convenience of description, omission of structures or simplification of structures are appropriately performed in the drawings. In addition, the mutual relationship of the size and position of the structure etc. which are shown in a different drawing is not necessarily described accurately, and can be changed suitably. In addition, in drawings such as plan views that are not cross-sectional views, hatching may be added in order to make the content of the embodiment easier to understand.

[0046] In addition, in the following description, the same structural member is attached|subjected and shown the same code|sy...

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Abstract

The invention provides a vacuum processing device capable of suppressing the generation of frictional heat or dust and the like due to the movement of a lifting pin mechanism. The vacuum processing apparatus includes: a vacuum chamber; a stage in which a hole is formed; a moving mechanism that moves the stage; and a lifting pin mechanism that is fixed in the vacuum chamber independently from the stage and that supports the substrate disposed on the stage from below, the lifting pin mechanism having: a lifting pin; and a pin moving unit that moves the lifting pin between a first height at which the lifting pin passes through the upper surface side of the stage through the hole and a second height at which the lifting pin is retracted to the lower surface side of the stage.

Description

technical field [0001] The technology disclosed in the specification of this application relates to a vacuum processing device. Substrates to be processed include, for example, substrates for flat panel displays (FPD) such as semiconductor wafers, glass substrates for liquid crystal display devices, organic EL (electro luminescence: electroluminescence) display devices, substrates for optical disks, and substrates for magnetic disks. , a substrate for a magneto-optical disk, a glass substrate for a photomask, a ceramic substrate, a substrate for a field emission display (ie, FED), a substrate for a solar cell, and the like. Background technique [0002] Conventionally, a vacuum processing apparatus is used that performs various processes on a processing object such as a substrate placed on a stage movable in a vacuum chamber. [0003] Patent Document 1: Japanese Patent Laid-Open No. 2001-135712 [0004] Holes through which lift pins for lifting the substrates pass are gene...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/687
CPCH01L21/68742H01L21/6875
Inventor 水野博喜
Owner DAINIPPON SCREEN MTG CO LTD