Fabricating fault tolerant non-linear waveguide cones

A nonlinear waveguide technology, applied in the design and manufacture of tapered waveguide, heterogeneous transition field, can solve the problem of increased light propagation loss and other issues

Pending Publication Date: 2022-04-01
OPENLIGHT PHOTONICS INC
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Moreover, the light propagation loss in the body of the waveguide increases linearly with the length of

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Fabricating fault tolerant non-linear waveguide cones
  • Fabricating fault tolerant non-linear waveguide cones
  • Fabricating fault tolerant non-linear waveguide cones

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] This paper describes a method for designing an optical waveguide transition with one or more nonlinear waveguide tapers that optimizes the trade-off between taper length and scattering loss. In a nonlinear waveguide cone, the cone profile (understood herein as the change in waveguide width as a function of length along the waveguide cone) is non-linear. For a given change in waveguide width with respect to a given cone length, a suitable nonlinear waveguide cone profile can achieve lower losses than a linear waveguide cone profile, or conversely, for a given limit on acceptable scattering losses, the nonlinear The waveguide cone can be designed shorter.

[0020] The precise cone profile for optimal performance depends on the scattering rate, which is a function of the waveguide width. The width-dependent scattering rate in turn depends on the design parameters of the waveguide transition, such as the fabricated dimensions (eg layer thickness) and material properties (e...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A non-linear waveguide cone for manufacturing fault tolerance of waveguide transitions may be designed by: for each of a plurality of sets of parameter values characterizing the waveguide transitions (e.g., a set of nominal parameter values and a set of parameter values associated with a process corner representing a process variation from the nominal parameter values); calculating the scattering rate associated with the waveguide transition as a function of the waveguide width of the waveguide cone; determining an envelope of the calculated width dependent scatter; and calculating a non-linear cone profile of the waveguide cone based on the envelope. For the plurality of sets of parameter values, light propagation and coupling along the waveguide transition may be further computationally simulated to determine a minimum transmission value associated with the waveguide transition for a specified cone length, and/or to determine a minimum cone length at which the transmission value associated with the waveguide transition exceeds a specified threshold transmission value.

Description

technical field [0001] The present disclosure relates to optical waveguide transitions in photonic integrated circuits (PICs), eg, heterogeneous transitions between silicon waveguides and III-V waveguides. More particularly, the disclosed embodiments relate to the design and fabrication of tapered waveguides for low loss transitions. Background technique [0002] Silicon-based PICs benefit from low optical losses, ease of integration with electronic components, and manufacturability using standard photolithographic techniques. To allow the integration of active photonic devices, such as lasers, optical amplifiers, optical modulators, and photodetectors, into photonic circuits, III-V materials characterized by high electro-optic efficiency can be used in heterogeneous (sometimes called is "Hybrid") material platform combined with silicon. One conventional approach to achieve this heterogeneous material integration involves bonding a III-V die to a pre-patterned silicon-on-i...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/00G02B6/122
CPCG02B6/1228G02B6/12002G02B2006/12147G02B6/136G02B2006/12061
Inventor N·达尔凡德E·J·诺伯格
Owner OPENLIGHT PHOTONICS INC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap