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Method of fabricating optical non-linear thin film waveguide and optical nonlinear thin film waveguide

An optical nonlinear and thin-film waveguide technology, applied in nonlinear optics, optics, instruments, etc., can solve the problems of increased waveguide size and inability to obtain single-mode propagation

Inactive Publication Date: 2003-11-05
TOYOTA JIDOSHA KK +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, in order to impart high optical nonlinearity, the size of the waveguide is increased such that single-mode propagation cannot be obtained

Method used

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  • Method of fabricating optical non-linear thin film waveguide and optical nonlinear thin film waveguide

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Embodiment Construction

[0019] Preferred embodiments of the present invention will be described below with reference to the accompanying drawings.

[0020] [Structure of Optical Nonlinear Thin Film Waveguide]

[0021] figure 1 The structure of the optical nonlinear thin-film waveguide (planar waveguide) according to the present invention is schematically shown. The glass substrate 10 is made of silica glass (SiO 2 glass) formed into flat sheets. Ge-doped SiO is formed on the surface of the substrate 2 Thin film 12, i.e. SiO containing Ge 2 The thickness of the thin film is about 1-5 μm, and the concentration of Ge is about 1-30% by mole. The specific value is determined according to the specifications of the planar waveguide, such as the wavelength to be used. Electrodes 14a and 14b are formed on SiO doped with Ge 2 On the film 12, prescribed pattern shapes are formed, and are opposed to each other with prescribed gaps therebetween. The electrodes 14a and 14b are formed of, for example, a thi...

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Abstract

Ge-doped SiO 2 A thin film 12 is formed on a glass substrate (10), and a metal film (14) is formed thereon (S11 to S13). By etching the metal film (14), a pair of electrodes (14a, 14b) are formed at a predetermined interval from each other (S14). A thin insulating film (16) is formed on the thin film (12) and the electrodes (14a, 14b) (S15). Simultaneously with the application of ultraviolet radiation, a high voltage is applied between the electrodes (14a, 14b) to perform UV excitation conversion, imparting optical nonlinearity to the channel portion (18) (S16). Light transmitted through the channel portion (18) is controlled by controlling the voltage applied to the optically non-linear channel portion (18). In this way, an optical nonlinear waveguide propagating single-mode light is formed on the glass substrate.

Description

technical field [0001] The invention relates to a method for manufacturing an optical nonlinear film waveguide and an optical nonlinear film waveguide using a glass matrix. In particular, the invention relates to controlling the shape of optical nonlinear waveguides. Background technique [0002] Optical functional elements utilizing second order optical nonlinearities are known. Whereas such elements are usually formed from crystalline materials, the optical fibers are formed from glass materials. Considering cost and compatibility with optical fibers, it is necessary to manufacture optical functional components of glass materials. Furthermore, since planar elements are suitable for realizing different optical control (signal control) functions, optically functional elements formed from glass matrices are required. [0003] A method of manufacturing a planar optical waveguide using a glass material is disclosed in Japanese Patent Laid-Open Publication Hei 8-146474. Acco...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/355G02F1/365
CPCG02F1/3555G02F1/3558G02F1/365
Inventor 藤原巧生嶋明米田修
Owner TOYOTA JIDOSHA KK
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