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Preparation method of color film substrate, color film substrate and display panel

A color film substrate and display panel technology, which is applied in nonlinear optics, instruments, optics, etc., can solve problems such as poor flatness and light leakage, and achieve the effect of improving flatness and display effect

Inactive Publication Date: 2022-04-05
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The purpose of the present invention is to provide a method for preparing a color filter substrate, a color filter substrate and a display panel, which can solve the problems of poor flatness and light leakage in the prior art

Method used

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  • Preparation method of color film substrate, color film substrate and display panel
  • Preparation method of color film substrate, color film substrate and display panel
  • Preparation method of color film substrate, color film substrate and display panel

Examples

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Embodiment 1

[0044] Such as Figure 5 As shown, this embodiment provides a display panel 100 . The display panel 100 includes: an array substrate 1 , a color filter substrate 2 and a liquid crystal layer 3 .

[0045]Wherein, the array substrate 1 includes: a film layer structure such as a thin film transistor device and a first electrode. Wherein, the thin film transistor device includes: an active layer, a gate insulating layer, a gate layer, an interlayer insulating layer, and a source-drain layer and other film layer structures.

[0046] Such as Figure 5 , Figure 6 As shown, the color filter substrate 2 is arranged opposite to the array substrate 1 . The color filter substrate 2 includes: a substrate 21 , a light shielding layer 22 and a color resist unit 23 .

[0047] Wherein, the light shielding layer 22 is disposed on a side of the substrate 21 facing the array substrate 1 . The material of the light-shielding layer 22 is chromium metal or chromium oxide. The light-shielding...

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Abstract

The invention relates to a preparation method of a color film substrate, the color film substrate and a display panel. The first mask plate is arranged on the side, away from the first photoresist, of the substrate, the exposure machine is arranged on the side, away from the first photoresist, of the first mask plate, and when the positions of the substrate and the mask plates do not deviate, light rays are blocked through the light shielding layer, the light rays are prevented from irradiating the first photoresist above the light shielding layer, and the exposure time is shortened. According to the invention, only the first photoresist in the first through hole is irradiated, so that the finally formed first color resistance unit is embedded in the first through hole, the first color resistance unit is prevented from covering the shading layer, the flatness of the first color resistance unit is improved, and the display effect of the display panel is improved.

Description

technical field [0001] The present application relates to the field of display technology, in particular to a method for preparing a color filter substrate, a color filter substrate and a display panel. Background technique [0002] With the development of Thin Film Transistor Liquid Crystal Display (TFT-LCD) technology, its cost has been reduced and its manufacturing process has been further improved, making it a mainstream technology in the field of flat panel display. TFT-LCD is composed of an array substrate and a color filter substrate. [0003] Such as figure 1 , figure 2 As shown, in the current manufacturing process of the color filter substrate, after the alignment of the mask plate 100 ′ and the substrate 200 ′ is corrected by the position of the alignment mark, light is emitted by an exposure machine, and the light passes through the mask plate 100 ′ to irradiate the substrate 200 ′. 'on the photoresist 300', and then develop to form the color resist unit 500'...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1335
Inventor 陈都
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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